Microstructure, mechanical and electrochemical properties evaluation of pulsed DC reactive magnetron sputtered nanostructured Cr-Zr-N and Cr-Zr-Si-N thin films

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal

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Author(s)

  • Jyh-Wei Lee
  • Shih-Tien Chang
  • Hsien-Wei Chen
  • Chi-Hong Chien
  • Jenq-Gong Duh
  • And 1 others
  • Chaur-Jeng Wang

Detail(s)

Original languageEnglish
Pages (from-to)1331-1338
Journal / PublicationSurface and Coatings Technology
Volume205
Issue number5
Online published9 Sep 2010
Publication statusPublished - 25 Nov 2010
Externally publishedYes

Abstract

Cr-Zr-Si-N thin films with various Zr contents were deposited by a bipolar asymmetric pulsed DC reactive magnetron sputtering system. In addition, a Cr-Zr-N film without Si addition was fabricated as a reference. The influence of Zr on the constitution, microstructure, mechanical, tribological and electrochemical properties of Cr-Zr-Si-N films was investigated. The microstructure of thin films was determined by a glancing angle X-ray diffractometer (GA-XRD), scanning electron microscopy (SEM) and transmission electron microscopy (TEM), respectively. A nanoindenter, a Vickers micro hardness tester and pin-on-disk wear tests were adopted to evaluate the hardness, toughness and tribological properties of thin films, respectively. The electrochemical properties of thin films were also evaluated in 3.5. wt.% NaCl aqueous solution. In case of the Cr-Zr-Si-N films, the Si content was fixed around 6-8. at.% and various Zr contents ranging from 0.5 to 13.6. at.% were achieved by changing the Zr target power density. In comparison to the Cr-Zr-N reference film, the addition of ~. 7.0. at.% Si in Cr-Zr-Si-N films resulted in a refined columnar structure and enhanced mechanical and anti-corrosion properties. A lattice constant expansion of these films was observed with increasing Zr content. A nanostructured thin film with around 5-10. nm grain size was obtained in case of a Cr-13.6. at.% Zr-6.8. at.% Si-N film. In general, the hardness, plastic deformation resistance and corrosion resistance increased also with increasing Zr content in the Cr-Zr-Si-N films. The Cr-Zr-Si-N film containing 13.6. at.% Zr exhibited a combination of high hardness, good mechanical properties, adequate tribological performance and excellent corrosion resistance in this study.

Research Area(s)

  • Corrosion, Cr-Zr-N thin film, Cr-Zr-Si-N thin film, Pulsed DC reactive magnetron sputtering, Toughness, Wear

Citation Format(s)

Microstructure, mechanical and electrochemical properties evaluation of pulsed DC reactive magnetron sputtered nanostructured Cr-Zr-N and Cr-Zr-Si-N thin films. / Lee, Jyh-Wei; Chang, Shih-Tien; Chen, Hsien-Wei; Chien, Chi-Hong; Duh, Jenq-Gong; Wang, Chaur-Jeng.

In: Surface and Coatings Technology, Vol. 205, No. 5, 25.11.2010, p. 1331-1338.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal