Microstructure array on Si and SiOx generated by micro-contact printing, wet chemical etching and reactive ion etching

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal

5 Scopus Citations
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Author(s)

  • Nabil A. Amro
  • Sandeep Disawal
  • Robert Elghanian
  • Roger Shile
  • Joseph Fragala

Detail(s)

Original languageEnglish
Pages (from-to)1960-1963
Journal / PublicationApplied Surface Science
Volume253
Issue number4
Online published2 May 2006
Publication statusPublished - 15 Dec 2006
Externally publishedYes

Abstract

A method, combining micro-contact printing (μCP), wet chemical etching and reactive ion etching (RIE), is reported to fabricate microstructures on Si and SiOx. Positive and negative structures were generated based on different stamps used for μCP. The reproducibility of the obtained microstructures shows the methodology reported herein could be useful in Micro-Electro-Mechanical Systems (MEMS), optical and biological sensing applications.

Research Area(s)

  • Micro-contact printing, Wet chemical etching, Reactive ion etching, Silicon, Silicon oxide

Citation Format(s)

Microstructure array on Si and SiOx generated by micro-contact printing, wet chemical etching and reactive ion etching. / Zhang, Hua; Amro, Nabil A.; Disawal, Sandeep; Elghanian, Robert; Shile, Roger; Fragala, Joseph.

In: Applied Surface Science, Vol. 253, No. 4, 15.12.2006, p. 1960-1963.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal