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Microstructure array on Si and SiOx generated by micro-contact printing, wet chemical etching and reactive ion etching

  • Hua Zhang*
  • , Nabil A. Amro
  • , Sandeep Disawal
  • , Robert Elghanian
  • , Roger Shile
  • , Joseph Fragala
  • *Corresponding author for this work

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

Abstract

A method, combining micro-contact printing (μCP), wet chemical etching and reactive ion etching (RIE), is reported to fabricate microstructures on Si and SiOx. Positive and negative structures were generated based on different stamps used for μCP. The reproducibility of the obtained microstructures shows the methodology reported herein could be useful in Micro-Electro-Mechanical Systems (MEMS), optical and biological sensing applications.
Original languageEnglish
Pages (from-to)1960-1963
JournalApplied Surface Science
Volume253
Issue number4
Online published2 May 2006
DOIs
Publication statusPublished - 15 Dec 2006
Externally publishedYes

Research Keywords

  • Micro-contact printing
  • Wet chemical etching
  • Reactive ion etching
  • Silicon
  • Silicon oxide

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