Microstructure and properties of titanium oxide synthesized by metal vacuum arc deposition

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)22_Publication in policy or professional journal

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Author(s)

  • Y. X. Leng
  • H. Sun
  • P. Yang
  • J. Y. Chen
  • J. Wang
  • G. J. Wan
  • N. Huang
  • Y. Leng

Detail(s)

Original languageEnglish
Journal / PublicationIEEE International Conference on Plasma Science
Publication statusPublished - 2002

Conference

Title2002 IEEE International Conference on plasma Science
PlaceCanada
CityBanff, Alta.
Period26 - 30 May 2002

Abstract

TiO2 films were deposited on silicon (100) substrates using metal vacuum arc deposition. Film composition was determined by RBS and the surface morphology was studied by AFM. The hardness and adherence strength of the substrate and films were assessed using the CSEM nano-hardness and nano-scratch testers.

Citation Format(s)

Microstructure and properties of titanium oxide synthesized by metal vacuum arc deposition. / Leng, Y. X.; Sun, H.; Yang, P.; Chen, J. Y.; Wang, J.; Wan, G. J.; Huang, N.; Chu, P. K.; Leng, Y.

In: IEEE International Conference on Plasma Science, 2002.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)22_Publication in policy or professional journal