TY - JOUR
T1 - Microstructure and properties of titanium oxide synthesized by metal vacuum arc deposition
AU - Leng, Y. X.
AU - Sun, H.
AU - Yang, P.
AU - Chen, J. Y.
AU - Wang, J.
AU - Wan, G. J.
AU - Huang, N.
AU - Chu, P. K.
AU - Leng, Y.
PY - 2002
Y1 - 2002
N2 - TiO2 films were deposited on silicon (100) substrates using metal vacuum arc deposition. Film composition was determined by RBS and the surface morphology was studied by AFM. The hardness and adherence strength of the substrate and films were assessed using the CSEM nano-hardness and nano-scratch testers.
AB - TiO2 films were deposited on silicon (100) substrates using metal vacuum arc deposition. Film composition was determined by RBS and the surface morphology was studied by AFM. The hardness and adherence strength of the substrate and films were assessed using the CSEM nano-hardness and nano-scratch testers.
UR - http://www.scopus.com/inward/record.url?scp=0036360765&partnerID=8YFLogxK
UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-0036360765&origin=recordpage
U2 - 10.1109/PLASMA.2002.1030690
DO - 10.1109/PLASMA.2002.1030690
M3 - RGC 22 - Publication in policy or professional journal
SN - 0730-9244
JO - IEEE International Conference on Plasma Science
JF - IEEE International Conference on Plasma Science
T2 - 2002 IEEE International Conference on plasma Science
Y2 - 26 May 2002 through 30 May 2002
ER -