Microstructure and mechanical properties of CrN films fabricated by high power pulsed magnetron discharge plasma immersion ion implantation and deposition

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal

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Author(s)

  • Zhongzhen Wu
  • Xiubo Tian
  • Zeming Wang
  • Chunzhi Gong
  • Shiqin Yang
  • Cher Ming Tan

Detail(s)

Original languageEnglish
Pages (from-to)242-246
Journal / PublicationApplied Surface Science
Volume258
Issue number1
Publication statusPublished - 15 Oct 2011

Abstract

CrN films with strong adhesion with the substrate have been fabricated on Ti6Al4V alloy using novel plasma immersion ion implantation and deposition (PIII&D) based on high power pulsed magnetron sputtering (HPPMS). A macro-particle free chromium plasma is generated by HPPMS while the samples are subjected to high voltage pulses to conduct PIII&D. The CrN coatings have a dense columnar structure and low surface roughness. The grains in the films have the face-center cubic (fcc) structure with the (2 0 0) preferred orientation. An excellent adhesion is achieved with a critical load up to 74.7 N. An implantation voltage of 18 kV yields a hardness of 18 GPa and better wear resistance and a low friction coefficient of 0.48 are achieved. © 2011 Elsevier B.V. All rights reserved.

Research Area(s)

  • CrN, High power pulsed magnetron sputtering, High-voltage pulse, Plasma ion implantation and deposition

Citation Format(s)

Microstructure and mechanical properties of CrN films fabricated by high power pulsed magnetron discharge plasma immersion ion implantation and deposition. / Wu, Zhongzhen; Tian, Xiubo; Wang, Zeming; Gong, Chunzhi; Yang, Shiqin; Tan, Cher Ming; Chu, Paul K.

In: Applied Surface Science, Vol. 258, No. 1, 15.10.2011, p. 242-246.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal