Micrograph and structure of CrN films prepared by plasma immersion ion implantation and deposition using HPPMS plasma source

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

18 Scopus Citations
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Author(s)

  • Zhongzhen Wu
  • Xiubo Tian
  • Chunzhi Gong
  • Shiqin Yang
  • Paul K. Chu

Detail(s)

Original languageEnglish
Pages (from-to)210-216
Journal / PublicationSurface and Coatings Technology
Volume229
Publication statusPublished - 25 Aug 2013

Abstract

In order to achieve excellent adhesion between coatings and substrates, PBII&D technique was proposed and used more and more widely to produce hard coatings. Among the metal plasma source, one based on HPPMS technique (HPPMS-PIID) proposed recently seems to have great prospects. The present study aims to develop the difference of CrN films deposited on Si (100) and SU201 stainless steel substrates with PBII&D technique using different metal plasma sources of HPPMS, FCA and DCMS. In contrast to the other two samples, the sample based on HPPMS appears to have dense knitting-like surface and discontinuous columnar structure. The highest intensity of CrN(200) preferential orientation, best adhesion and hardness is obtained by HPPMS plasma source for the highly energetic ion implantation and bombardment, but the C fraction is a little higher since the sputtering of highly energetic ions. © 2012 Elsevier B.V.

Research Area(s)

  • CrN, High power pulsed magnetron sputtering, Micro-structure, Plasma Base ion implantation and deposition, Surface properties

Citation Format(s)