MgNi/Pd multilayer hydrogen storage thin films prepared by dc magnetron sputtering

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal

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Author(s)

Detail(s)

Original languageEnglish
Pages (from-to)58-61
Journal / PublicationJournal of Alloys and Compounds
Volume422
Issue number1-2
Publication statusPublished - 28 Sep 2006

Abstract

MgNi/Pd multilayer thin films were deposited on Ni substrate by direct current (dc) magnetron sputtering using a dual-target, each MgNi layer being 40 nm and each Pd layer being 16 nm in thickness. The total thickness of the MgNi/Pd multilayer thin film is about 1.7 μm. X-ray diffraction and scanning electron microscopy analysis revealed that the microstructure of the MgNi layer is amorphous and/or nanocrystalline and that the microstructure of the Pd layer is fine grained crystalline with no preferential orientation. A pressure-composition-isotherm (PCI) measurement of films proved that the hydrogen absorption content reached to 4.6 mass% at room temperature and hydrogen desorption reached 3.4 mass% hydrogen. The deposited MgNi/Pd multilayer thin films show an interesting behavior of discharge capacity with a maximal value of 505 mAh/g. © 2005 Elsevier B.V. All rights reserved.

Research Area(s)

  • Hydrogen storage, Magnesium (Mg), Magnetron sputtering, Thin films

Citation Format(s)

MgNi/Pd multilayer hydrogen storage thin films prepared by dc magnetron sputtering. / Ouyang, L. Z.; Wang, H.; Chung, C. Y.; Ahn, J. H.; Zhu, M.

In: Journal of Alloys and Compounds, Vol. 422, No. 1-2, 28.09.2006, p. 58-61.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal