Metastable phase formation in thin film reactions
Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
Author(s)
Detail(s)
| Original language | English |
|---|---|
| Pages (from-to) | 1244-1247 |
| Journal / Publication | Materials Science and Engineering A |
| Volume | 134 |
| Issue number | C |
| Publication status | Published - 25 Mar 1991 |
| Externally published | Yes |
Link(s)
Abstract
The phenomenon of metastable phase formation during a constant temperature and constant pressure thin film reaction is explained by a kinetic model emphasizing the rate of transition. It is assumed that the reaction obeys a maximum time-dependent rather than time-independent negative free energy change. The product persists in the metastable state due to a high activation barrier to later transition. © 1991.
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Citation Format(s)
Metastable phase formation in thin film reactions. / Tu, K. N.
In: Materials Science and Engineering A, Vol. 134, No. C, 25.03.1991, p. 1244-1247.
In: Materials Science and Engineering A, Vol. 134, No. C, 25.03.1991, p. 1244-1247.
Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
