Abstract
An amorphous alloy with a composition Au-28. 5 at. % Si (Au//5Si//2) has been formed by implanting energetic Xe, Ar and Ne ions through a thin layer of Au deposited on a Si substrate. The amorphous alloy phase was unstable at temperatures above 100 degree C and transformed into a metastable crystalline phase with a hexagonal crystal structure. This metastable phase then decomposed into an equilibrium mixture of Au and Si at higher annealing temperatures ( greater than 180 degree C). The sequential decomposition of the amorphous and metastable phases were also observed at room temperature but during several weeks. The atomic mechanisms involved in interface mixing are discussed. The results are compared with those obtained by rapid quenching techniques and thermal treatment of Au films on single crystal Si substrates.
| Original language | English |
|---|---|
| Title of host publication | Proceedings - Annual Symposium on Computer Applications in Medical Care |
| Publisher | Metall Soc of AIME |
| Pages | 142-151 |
| Publication status | Published - 1980 |
| Externally published | Yes |
| Event | Ion Implantation Metall, Proc of a Symp at Annu Meet of the Mater Res Soc - Cambridge, MA, Engl Duration: 30 Nov 1979 → 30 Nov 1979 |
Conference
| Conference | Ion Implantation Metall, Proc of a Symp at Annu Meet of the Mater Res Soc |
|---|---|
| City | Cambridge, MA, Engl |
| Period | 30/11/79 → 30/11/79 |
Bibliographical note
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