Metastability in slow thin-film reactions

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

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Detail(s)

Original languageEnglish
Pages (from-to)1198-1201
Journal / PublicationPhysical Review B
Volume43
Issue number1
Publication statusPublished - 1991
Externally publishedYes

Abstract

The phenomenon of slow amorphization during a constant-temperature and constant-pressure thin-film reaction is explained by a kinetic model emphasizing the rate of transition. We assume that the reaction obeys a maximum time-dependent rather than time-independent negative free-energy change. The product persists in the metastable state due to a high activation barrier to later transition. An amorphous Rh-Si alloy formed by thermally reacting a crystalline Rh thin film and single-crystal Si is reported. © 1991 The American Physical Society.

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Citation Format(s)

Metastability in slow thin-film reactions. / Tu, K. N.; Herd, S. R.; Gösele, U.
In: Physical Review B, Vol. 43, No. 1, 1991, p. 1198-1201.

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review