Metallization of GaN Thin Films Prepared by Ion Beam Assisted Molecular Beam Epitaxy
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
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Detail(s)
Original language | English |
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Pages (from-to) | 223-227 |
Journal / Publication | Materials Research Society Symposium - Proceedings |
Volume | 339 |
Publication status | Published - Dec 1994 |
Conference
Title | 1994 MRS Spring Meeting |
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Place | United States |
City | San Francisco, CA |
Period | 4 - 8 April 1994 |
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Abstract
Gallium nitride has generated much interest due to its ability to emit light in the blue to UV range [1]. We have investigated the ohmic contact properties of various metals evaporated onto highly auto-doped n-type GaN thin films which were grown on basal sapphire substrates by ion-assisted molecular beam epitaxy (IAMBE). Electrical measurements of transmission line structures with the metals In, InSn and AuGeNi revealed a wide range of contact resistivity (10-2 to 10-6 Ω-cm2) which changed with annealing.
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Research Unit(s) information for this publication is provided by the author(s) concerned.
Citation Format(s)
Metallization of GaN Thin Films Prepared by Ion Beam Assisted Molecular Beam Epitaxy. / Chan, J. S.; Fu, T. C.; Cheung, N. W. et al.
In: Materials Research Society Symposium - Proceedings, Vol. 339, 12.1994, p. 223-227.
In: Materials Research Society Symposium - Proceedings, Vol. 339, 12.1994, p. 223-227.
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review