Metal-Guided Selective Growth of 2D Materials : Demonstration of a Bottom-Up CMOS Inverter
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Author(s)
Detail(s)
Original language | English |
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Article number | 1900861 |
Journal / Publication | Advanced Materials |
Volume | 31 |
Issue number | 18 |
Publication status | Published - 3 May 2019 |
Externally published | Yes |
Link(s)
Abstract
2D transition metal dichalcogenide (TMD) layered materials are promising for future electronic and optoelectronic applications. The realization of large-area electronics and circuits strongly relies on wafer-scale, selective growth of quality 2D TMDs. Here, a scalable method, namely, metal-guided selective growth (MGSG), is reported. The success of control over the transition-metal-precursor vapor pressure, the first concurrent growth of two dissimilar monolayer TMDs, is demonstrated in conjunction with lateral or vertical TMD heterojunctions at precisely desired locations over the entire wafer in a single chemical vapor deposition (VCD) process. Owing to the location selectivity, MGSG allows the growth of p- and n-type TMDs with spatial homogeneity and uniform electrical performance for circuit applications. As a demonstration, the first bottom-up complementary metal-oxide-semiconductor inverter based on p-type WSe <sub>2</sub> and n-type MoSe <sub>2</sub> is achieved, which exhibits a high and reproducible voltage gain of 23 with little dependence on position. © 2019 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Research Area(s)
- 2D materials, chemical vapor deposition, heterojunctions, molybdenum diselenide, selective growth, transition metal dichalcogenides, tungsten diselenide
Bibliographic Note
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Citation Format(s)
Metal-Guided Selective Growth of 2D Materials: Demonstration of a Bottom-Up CMOS Inverter. / Chiu, Ming-Hui; Tang, Hao-Ling; Tseng, Chien-Chih et al.
In: Advanced Materials, Vol. 31, No. 18, 1900861, 03.05.2019.
In: Advanced Materials, Vol. 31, No. 18, 1900861, 03.05.2019.
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review