Metal ion mixing in diamond

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • M. C. Salvadori
  • M. Cattani
  • A. Vizir
  • O. R. Monteiro
  • I. G. Brown

Detail(s)

Original languageEnglish
Pages (from-to)375-380
Journal / PublicationSurface and Coatings Technology
Volume128-129
Issue number1
Publication statusPublished - 1 Jun 2000
Externally publishedYes

Abstract

We have carried out some investigations of the mixing of thin metal films into diamond by energetic metal ion bombardment. Free-standing diamond films were made by microwave plasma-assisted CVD, onto which films of Nb or Ta, approximately 100 Å thick, were deposited using a filtered vacuum arc plasma technique. The metalized diamond was then bombarded with a Ta and Nb ion beam, respectively, at an energy of 150 keV and to an applied dose of ∼7 × 1016 ions/cm2. The Nb and Ta depth profiles were measured by 2 MeV He+ Rutherford backscattering spectrometry. Intense intermixing was produced between the original metal overlay, the diamond matrix, and the implanted atoms; and the concentration depth profiles were found to be well-described by the predictions of the TRIM code. Here, we outline the techniques used for diamond synthesis and the preparation of free-standing films, the vacuum arc plasma deposition of Nb and Ta thin films, and the Ta and Nb ion implantations; and we describe our observations of the ion-mixed films formed in this way. © 2000 Elsevier Science S.A. All rights reserved.

Research Area(s)

  • Diamond films, Ion beams, Ion implantation, Ion mixing, Thin films

Citation Format(s)

Metal ion mixing in diamond. / Salvadori, M. C.; Cattani, M.; Vizir, A.; Monteiro, O. R.; Yu, K. M.; Brown, I. G.

In: Surface and Coatings Technology, Vol. 128-129, No. 1, 01.06.2000, p. 375-380.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review