Abstract
Plasmonic materials offer the remarkable ability to manipulate light by metal-dielectric features significantly smaller than the wavelengths of free space photons. The fabrication of such miniscule features for the desired plasmonic properties, however, remains challenging. Here we report an economical and versatile bottom-up approach that combines electrodeposition and dealloying techniques for fabricating elaborate metal-based structures, achieving structural resolutions comparable to current lithography techniques. We present our studies on the metalbased counterpart of the rugate filter. These metal-based photonic films are porous, magnetic, and feature strong optical responses in visible wavelengths, while their structural periodicities are an order of magnitude smaller than the light's free space wavelength. ©2010 IEEE.
Original language | English |
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Title of host publication | INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings |
Pages | 1321-1322 |
DOIs | |
Publication status | Published - 2010 |
Event | 3rd IEEE International NanoElectronics Conference (INEC 2010) - City University of Hong Kong, Hong Kong, China Duration: 3 Jan 2010 → 8 Jan 2010 http://www.cityu.edu.hk/ieeeinec/ |
Conference
Conference | 3rd IEEE International NanoElectronics Conference (INEC 2010) |
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Country/Territory | China |
City | Hong Kong |
Period | 3/01/10 → 8/01/10 |
Internet address |