Meta-device : advanced manufacturing

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

2 Scopus Citations
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Author(s)

Detail(s)

Original languageEnglish
Article number5
Pages (from-to)117-132
Journal / PublicationLight: Advanced Manufacturing
Volume5
Issue number1
Online published7 Mar 2024
Publication statusPublished - 2024

Link(s)

Abstract

Metasurfaces are one of the most promising devices to break through the limitations of bulky optical components. By offering a new method of light manipulation based on the light-matter interaction in subwavelength nanostructures, metasurfaces enable the efficient manipulation of the amplitude, phase, polarization, and frequency of light and derive a series of possibilities for important applications. However, one key challenge for the realization of applications for meta-devices is how to fabricate large-scale, uniform nanostructures with high resolution. In this review, we review the state-of-the-art nanofabrication techniques compatible with the manufacture of meta-devices. Maskless lithography, masked lithography, and other nanofabrication techniques are highlighted in detail. We also delve into the constraints and limitations of the current fabrication methods while providing some insights on solutions to overcome these challenges for advanced nanophotonic applications.

© The Author(s) 2024

Research Area(s)

  • Meta-device, Metasurface, Nanofabrication, COMS-compatible fabrication

Citation Format(s)

Meta-device: advanced manufacturing. / Leng, Borui; Zhang, Yao; Tsai, Din Ping et al.
In: Light: Advanced Manufacturing, Vol. 5, No. 1, 5, 2024, p. 117-132.

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

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