Meta-device: advanced manufacturing

Borui Leng; Yao Zhang; Din Ping Tsai; Shumin Xiao

doi:10.37188/lam.2024.005

Meta-device: advanced manufacturing

Borui Leng (Co-first Author)
, Yao Zhang (Co-first Author)
, Din Ping Tsai^*
, Shumin Xiao^*

^*Corresponding author for this work

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

73 Citations (Scopus)

1327 Downloads (CityUHK Scholars)

Abstract

Metasurfaces are one of the most promising devices to break through the limitations of bulky optical components. By offering a new method of light manipulation based on the light-matter interaction in subwavelength nanostructures, metasurfaces enable the efficient manipulation of the amplitude, phase, polarization, and frequency of light and derive a series of possibilities for important applications. However, one key challenge for the realization of applications for meta-devices is how to fabricate large-scale, uniform nanostructures with high resolution. In this review, we review the state-of-the-art nanofabrication techniques compatible with the manufacture of meta-devices. Maskless lithography, masked lithography, and other nanofabrication techniques are highlighted in detail. We also delve into the constraints and limitations of the current fabrication methods while providing some insights on solutions to overcome these challenges for advanced nanophotonic applications.

© The Author(s) 2024

Original language	English
Article number	5
Pages (from-to)	117-132
Journal	Light: Advanced Manufacturing
Volume	5
Issue number	1
Online published	7 Mar 2024
DOIs	https://doi.org/10.37188/lam.2024.005
Publication status	Published - 2024

Funding

Authors acknowledge the support from the University Grants Committee / Research Grants Council of the Hong Kong Special Administrative Region, China [Project No. AoE/P-502/20, CRF Project: C1015-21E; C5031-22G; and GRF Project: CityU15303521; CityU11305223; CityU11310522; CityU11300123], the Department of Science and Technology of Guangdong Province [Project No. 2020B1515120073], and City University of Hong Kong [Project No. 9380131, 9610628, and 7005867]. S.M. Xiao acknowledges financial support from National Key R&D Program of China (Grant Nos. 2021YFA1400802), the National Natural Science Foundation of China (Grant Nos. 62125501, and 6233000076), Fundamental Research Funds for the Central Universities (Grant No. 2022FRRK030004), and Shenzhen Fundamental Research Projects (Grant Nos. JCYJ20220818102218040).

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 9 Industry, Innovation, and Infrastructure

Research Keywords

Meta-device
Metasurface
Nanofabrication
COMS-compatible fabrication

Publisher's Copyright Statement

This full text is made available under CC-BY 4.0. https://creativecommons.org/licenses/by/4.0/

RGC Funding Information

RGC-funded

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10.37188/lam.2024.005

195152939.pdfFinal Published version, 11.9 MBLicence: CC BY

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title = "Meta-device: advanced manufacturing",

abstract = "Metasurfaces are one of the most promising devices to break through the limitations of bulky optical components. By offering a new method of light manipulation based on the light-matter interaction in subwavelength nanostructures, metasurfaces enable the efficient manipulation of the amplitude, phase, polarization, and frequency of light and derive a series of possibilities for important applications. However, one key challenge for the realization of applications for meta-devices is how to fabricate large-scale, uniform nanostructures with high resolution. In this review, we review the state-of-the-art nanofabrication techniques compatible with the manufacture of meta-devices. Maskless lithography, masked lithography, and other nanofabrication techniques are highlighted in detail. We also delve into the constraints and limitations of the current fabrication methods while providing some insights on solutions to overcome these challenges for advanced nanophotonic applications. {\textcopyright} The Author(s) 2024 ",

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T2 - advanced manufacturing

AU - Leng, Borui

AU - Zhang, Yao

AU - Tsai, Din Ping

AU - Xiao, Shumin

PY - 2024

Y1 - 2024

N2 - Metasurfaces are one of the most promising devices to break through the limitations of bulky optical components. By offering a new method of light manipulation based on the light-matter interaction in subwavelength nanostructures, metasurfaces enable the efficient manipulation of the amplitude, phase, polarization, and frequency of light and derive a series of possibilities for important applications. However, one key challenge for the realization of applications for meta-devices is how to fabricate large-scale, uniform nanostructures with high resolution. In this review, we review the state-of-the-art nanofabrication techniques compatible with the manufacture of meta-devices. Maskless lithography, masked lithography, and other nanofabrication techniques are highlighted in detail. We also delve into the constraints and limitations of the current fabrication methods while providing some insights on solutions to overcome these challenges for advanced nanophotonic applications. © The Author(s) 2024

AB - Metasurfaces are one of the most promising devices to break through the limitations of bulky optical components. By offering a new method of light manipulation based on the light-matter interaction in subwavelength nanostructures, metasurfaces enable the efficient manipulation of the amplitude, phase, polarization, and frequency of light and derive a series of possibilities for important applications. However, one key challenge for the realization of applications for meta-devices is how to fabricate large-scale, uniform nanostructures with high resolution. In this review, we review the state-of-the-art nanofabrication techniques compatible with the manufacture of meta-devices. Maskless lithography, masked lithography, and other nanofabrication techniques are highlighted in detail. We also delve into the constraints and limitations of the current fabrication methods while providing some insights on solutions to overcome these challenges for advanced nanophotonic applications. © The Author(s) 2024

KW - Meta-device

KW - Metasurface

KW - Nanofabrication

KW - COMS-compatible fabrication

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U2 - 10.37188/lam.2024.005

DO - 10.37188/lam.2024.005

M3 - RGC 21 - Publication in refereed journal

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Meta-device: advanced manufacturing

Abstract

Funding

UN SDGs

Research Keywords

Publisher's Copyright Statement

RGC Funding Information

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