TY - JOUR
T1 - Mechanism that governs the electro-optic response of second-order nonlinear polymers on silicon substrates
AU - Schulz, K. Marvin
AU - Prorok, Stefan
AU - Jalas, Dirk
AU - Marder, Seth R.
AU - Luo, Jingdong
AU - Jen, Alex K.-Y.
AU - Zierold, Robert
AU - Nielsch, Kornelius
AU - Eich, Manfred
PY - 2015/8/1
Y1 - 2015/8/1
N2 - We use a modified Teng-Man technique to investigate the poling induced electro-optic activity of chromophore-doped organic polymers poled on silicon substrate in a thin film sample configuration. We reveal a fundamental difference between the poling processes on silicon substrate and ITO substrate. The electro-optic activity for polymers poled on silicon substrate is reduced which we ascribe to space charge formation at the silicon - organic interface that distorts the field distribution in the polymer film during high field poling, and therefore limits the effective induced polar order. We demonstrate that the electro-optic activity on silicon substrate can be improved by inserting a 5 nm thin dielectric layer of Al2O3q between the silicon substrate and the polymer which reduces the leakthrough current during poling, thereby allowing for higher applicable poling voltages.
AB - We use a modified Teng-Man technique to investigate the poling induced electro-optic activity of chromophore-doped organic polymers poled on silicon substrate in a thin film sample configuration. We reveal a fundamental difference between the poling processes on silicon substrate and ITO substrate. The electro-optic activity for polymers poled on silicon substrate is reduced which we ascribe to space charge formation at the silicon - organic interface that distorts the field distribution in the polymer film during high field poling, and therefore limits the effective induced polar order. We demonstrate that the electro-optic activity on silicon substrate can be improved by inserting a 5 nm thin dielectric layer of Al2O3q between the silicon substrate and the polymer which reduces the leakthrough current during poling, thereby allowing for higher applicable poling voltages.
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U2 - 10.1364/OME.5.001653
DO - 10.1364/OME.5.001653
M3 - RGC 21 - Publication in refereed journal
SN - 2159-3930
VL - 5
SP - 1653
EP - 1660
JO - Optical Materials Express
JF - Optical Materials Express
IS - 8
ER -