Mechanical properties of amorphous carbon nitride films synthesized by electron cyclotron resonance microwave plasma chemical vapor deposition
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Author(s)
Related Research Unit(s)
Detail(s)
Original language | English |
---|---|
Pages (from-to) | 180-185 |
Journal / Publication | Journal of Non-Crystalline Solids |
Volume | 254 |
Issue number | 1-3 |
Publication status | Published - Sept 1999 |
Conference
Title | Proceedings of the 1998 2nd International Conference on Amorphous and Crystalline Insulating Thin Films II |
---|---|
City | Hong Kong, China |
Period | 12 - 14 October 1998 |
Link(s)
Abstract
Amorphous carbon nitride films have been deposited on silicon using electron cyclotron resonance microwave plasma chemical vapor deposition with radiofrequency substrate bias. The films were measured by Auger electron spectroscopy, atomic force microscopy, nanoindentation, and nanoscratch test. The studies revealed that the hardness and surface roughness decreased with increasing nitrogen content in the films. These were due to the formation of sp2 graphite clusters and carbon-nitrogen triple bonds in the carbon network. We demonstrate that hydrogen surface treatment can reduce the friction coefficient in nanoscratch tests.
Citation Format(s)
Mechanical properties of amorphous carbon nitride films synthesized by electron cyclotron resonance microwave plasma chemical vapor deposition. / Chan, Wai-Chung; Fung, Man-Keung; Lai, Kai-Ho et al.
In: Journal of Non-Crystalline Solids, Vol. 254, No. 1-3, 09.1999, p. 180-185.
In: Journal of Non-Crystalline Solids, Vol. 254, No. 1-3, 09.1999, p. 180-185.
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review