Mechanical properties of amorphous carbon nitride films synthesized by electron cyclotron resonance microwave plasma chemical vapor deposition

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

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Author(s)

  • Wai-Chung Chan
  • Man-Keung Fung
  • Kai-Ho Lai
  • Igor Bello
  • Shuit-Tong Lee

Detail(s)

Original languageEnglish
Pages (from-to)180-185
Journal / PublicationJournal of Non-Crystalline Solids
Volume254
Issue number1-3
Publication statusPublished - Sept 1999

Conference

TitleProceedings of the 1998 2nd International Conference on Amorphous and Crystalline Insulating Thin Films II
CityHong Kong, China
Period12 - 14 October 1998

Abstract

Amorphous carbon nitride films have been deposited on silicon using electron cyclotron resonance microwave plasma chemical vapor deposition with radiofrequency substrate bias. The films were measured by Auger electron spectroscopy, atomic force microscopy, nanoindentation, and nanoscratch test. The studies revealed that the hardness and surface roughness decreased with increasing nitrogen content in the films. These were due to the formation of sp2 graphite clusters and carbon-nitrogen triple bonds in the carbon network. We demonstrate that hydrogen surface treatment can reduce the friction coefficient in nanoscratch tests.

Citation Format(s)

Mechanical properties of amorphous carbon nitride films synthesized by electron cyclotron resonance microwave plasma chemical vapor deposition. / Chan, Wai-Chung; Fung, Man-Keung; Lai, Kai-Ho et al.
In: Journal of Non-Crystalline Solids, Vol. 254, No. 1-3, 09.1999, p. 180-185.

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review