Measurement of optical mirror with a small-aperture interferometer

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal

1 Scopus Citations
View graph of relations

Author(s)

Detail(s)

Original languageEnglish
Pages (from-to)218-223
Journal / PublicationFrontiers of Optoelectronics
Volume5
Issue number2
Publication statusPublished - 2012

Abstract

In this paper, the principle of subaperture stitching interferometry was introduced. A testing stage with five degrees of freedom for stitching interferometry was built. A model based on least-squares method and error averaging method for data processing was established, which could reduce error accumulation and improve the precision. A 100 mm plane mirror was measured with a 50 mm aperture interferometer by means of stitching interferometry. Compared with the results by a 100 mm interferometer, peak to valley (PV) and root mean square (RMS) of the phase distribution residual are 0:0038λ and 0:0004λ, respectively. It proved that the model and method are helpful for large optical measurement. © 2012 Higher Education Press and Springer-Verlag Berlin Heidelberg.

Research Area(s)

  • interferometry, residual error, subaperture stitching

Citation Format(s)

Measurement of optical mirror with a small-aperture interferometer. / Gao, Ya; Tam, Hon Yuen; Wen, Yongfu; Zhang, Huijing; Cheng, Haobo.

In: Frontiers of Optoelectronics, Vol. 5, No. 2, 2012, p. 218-223.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal