Measurement of optical mirror with a small-aperture interferometer

Ya Gao; Hon Yuen Tam; Yongfu Wen; Huijing Zhang; Haobo Cheng

doi:10.1007/s12200-012-0233-6

Measurement of optical mirror with a small-aperture interferometer

Ya Gao, Hon Yuen Tam, Yongfu Wen, Huijing Zhang, Haobo Cheng

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

1 Citation (Scopus)

Abstract

In this paper, the principle of subaperture stitching interferometry was introduced. A testing stage with five degrees of freedom for stitching interferometry was built. A model based on least-squares method and error averaging method for data processing was established, which could reduce error accumulation and improve the precision. A 100 mm plane mirror was measured with a 50 mm aperture interferometer by means of stitching interferometry. Compared with the results by a 100 mm interferometer, peak to valley (PV) and root mean square (RMS) of the phase distribution residual are 0:0038λ and 0:0004λ, respectively. It proved that the model and method are helpful for large optical measurement. © 2012 Higher Education Press and Springer-Verlag Berlin Heidelberg.

Original language	English
Pages (from-to)	218-223
Journal	Frontiers of Optoelectronics
Volume	5
Issue number	2
DOIs	https://doi.org/10.1007/s12200-012-0233-6
Publication status	Published - 2012

Research Keywords

interferometry
residual error
subaperture stitching

Access Output

10.1007/s12200-012-0233-6

Other Access Options

Check CityUHK Library

Permanent Link

Right click to copy link

Cite this

@article{a2c05a3270f14d95b54108be25887afe,

title = "Measurement of optical mirror with a small-aperture interferometer",

abstract = "In this paper, the principle of subaperture stitching interferometry was introduced. A testing stage with five degrees of freedom for stitching interferometry was built. A model based on least-squares method and error averaging method for data processing was established, which could reduce error accumulation and improve the precision. A 100 mm plane mirror was measured with a 50 mm aperture interferometer by means of stitching interferometry. Compared with the results by a 100 mm interferometer, peak to valley (PV) and root mean square (RMS) of the phase distribution residual are 0:0038λ and 0:0004λ, respectively. It proved that the model and method are helpful for large optical measurement. {\textcopyright} 2012 Higher Education Press and Springer-Verlag Berlin Heidelberg.",

keywords = "interferometry, residual error, subaperture stitching",

author = "Ya Gao and Tam, {Hon Yuen} and Yongfu Wen and Huijing Zhang and Haobo Cheng",

year = "2012",

doi = "10.1007/s12200-012-0233-6",

language = "English",

volume = "5",

pages = "218--223",

journal = "Frontiers of Optoelectronics",

issn = "2095-2759",

publisher = "Higher Education Press",

number = "2",

}

TY - JOUR

T1 - Measurement of optical mirror with a small-aperture interferometer

AU - Gao, Ya

AU - Tam, Hon Yuen

AU - Wen, Yongfu

AU - Zhang, Huijing

AU - Cheng, Haobo

PY - 2012

Y1 - 2012

N2 - In this paper, the principle of subaperture stitching interferometry was introduced. A testing stage with five degrees of freedom for stitching interferometry was built. A model based on least-squares method and error averaging method for data processing was established, which could reduce error accumulation and improve the precision. A 100 mm plane mirror was measured with a 50 mm aperture interferometer by means of stitching interferometry. Compared with the results by a 100 mm interferometer, peak to valley (PV) and root mean square (RMS) of the phase distribution residual are 0:0038λ and 0:0004λ, respectively. It proved that the model and method are helpful for large optical measurement. © 2012 Higher Education Press and Springer-Verlag Berlin Heidelberg.

AB - In this paper, the principle of subaperture stitching interferometry was introduced. A testing stage with five degrees of freedom for stitching interferometry was built. A model based on least-squares method and error averaging method for data processing was established, which could reduce error accumulation and improve the precision. A 100 mm plane mirror was measured with a 50 mm aperture interferometer by means of stitching interferometry. Compared with the results by a 100 mm interferometer, peak to valley (PV) and root mean square (RMS) of the phase distribution residual are 0:0038λ and 0:0004λ, respectively. It proved that the model and method are helpful for large optical measurement. © 2012 Higher Education Press and Springer-Verlag Berlin Heidelberg.

KW - interferometry

KW - residual error

KW - subaperture stitching

UR - http://www.scopus.com/inward/record.url?scp=84873834566&partnerID=8YFLogxK

UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-84873834566&origin=recordpage

U2 - 10.1007/s12200-012-0233-6

DO - 10.1007/s12200-012-0233-6

M3 - RGC 21 - Publication in refereed journal

SN - 2095-2759

VL - 5

SP - 218

EP - 223

JO - Frontiers of Optoelectronics

JF - Frontiers of Optoelectronics

IS - 2

ER -

Measurement of optical mirror with a small-aperture interferometer

Abstract

Research Keywords

Access Output

Other Access Options

Permanent Link

Other Files and Links

Fingerprint

Cite this