MEASUREMENT OF BORON CONTAMINATION IN N+ SILICON SUBSTRATES BY SECONDARY ION MASS SPECTROMETRY

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

Original language	English
Journal	Electrochemical Society Extended Abstracts
Volume	93-1
Publication status	Published - May 1993
Externally published	Yes
Event	1993 Electrochemical Society Meeting - Honolulu, United States Duration: 16 May 1993 → 21 May 1993

Other Access Options

@article{634e1dc36b5f424b8d5b17927cd01d31,

title = "MEASUREMENT OF BORON CONTAMINATION IN N+ SILICON SUBSTRATES BY SECONDARY ION MASS SPECTROMETRY",

author = "Chu, \{P. K.\} and Bleiler, \{R. J.\} and Metz, \{J. M.\} and Hitzman, \{C. J.\} and Hockett, \{R. S.\}",

year = "1993",

month = may,

language = "English",

volume = "93-1",

journal = "Electrochemical Society Extended Abstracts",

issn = "0160-4619",

note = "1993 Electrochemical Society Meeting ; Conference date: 16-05-1993 Through 21-05-1993",

}

TY - JOUR

T1 - MEASUREMENT OF BORON CONTAMINATION IN N+ SILICON SUBSTRATES BY SECONDARY ION MASS SPECTROMETRY

AU - Chu, P. K.

AU - Bleiler, R. J.

AU - Metz, J. M.

AU - Hitzman, C. J.

AU - Hockett, R. S.

PY - 1993/5

Y1 - 1993/5

M3 - RGC 21 - Publication in refereed journal

SN - 0160-4619

VL - 93-1

JO - Electrochemical Society Extended Abstracts

JF - Electrochemical Society Extended Abstracts

T2 - 1993 Electrochemical Society Meeting

Y2 - 16 May 1993 through 21 May 1993

ER -