Masks for COVID-19
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Author(s)
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Detail(s)
Original language | English |
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Article number | 2102189 |
Journal / Publication | Advanced Science |
Volume | 9 |
Issue number | 3 |
Online published | 26 Nov 2021 |
Publication status | Published - 25 Jan 2022 |
Link(s)
DOI | DOI |
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Attachment(s) | Documents
Publisher's Copyright Statement
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Link to Scopus | https://www.scopus.com/record/display.uri?eid=2-s2.0-85119857402&origin=recordpage |
Permanent Link | https://scholars.cityu.edu.hk/en/publications/publication(07790af3-f784-4b09-876e-d27a4a19d39c).html |
Abstract
Sustainable solutions on fabricating and using a face mask to block the severe acute respiratory syndrome coronavirus 2 (SARS-CoV-2) spread during this coronavirus pandemic of 2019 (COVID-19) are required as society is directed by the World Health Organization (WHO) toward wearing it, resulting in an increasingly huge demand with over 4 000 000 000 masks used per day globally. Herein, various new mask technologies and advanced materials are reviewed to deal with critical shortages, cross-infection, and secondary transmission risk of masks. A number of countries have used cloth masks and 3D-printed masks as substitutes, whose filtration efficiencies can be improved by using nanofibers or mixing other polymers into them. Since 2020, researchers continue to improve the performance of masks by adding various functionalities, for example using metal nanoparticles and herbal extracts to inactivate pathogens, using graphene to make masks photothermal and superhydrophobic, and using triboelectric nanogenerator (TENG) to prolong mask lifetime. The recent advances in material technology have led to the development of antimicrobial coatings, which are introduced in this review. When incorporated into masks, these advanced materials and technologies can aid in the prevention of secondary transmission of the virus.
Research Area(s)
- antimicrobial materials, COVID-19, graphene, photothermal, SARS-CoV-2, substitutes, superhydrophobic, triboelectric nanogenerators
Citation Format(s)
Masks for COVID-19. / Deng, Wei; Sun, Yajun; Yao, Xiaoxue et al.
In: Advanced Science, Vol. 9, No. 3, 2102189, 25.01.2022.
In: Advanced Science, Vol. 9, No. 3, 2102189, 25.01.2022.
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
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