Abstract
MASK is exhibited in the peer-reviewed exhibition of the international Symposium on Electronic Arts 2016 in Hong Kong at the exhibition venue of the Polytechnic University of Hong Kong Please see attached document for further information.
| Original language | English |
|---|---|
| Publication status | Published - 16 Mar 2016 |
| Event | 22nd International Symposium on Electronic Arts (ISEA2016) - , Hong Kong, China Duration: 16 May 2016 → 22 May 2016 Conference number: 22 https://isea2016.isea-international.org/home-mobile/ https://www.scm.cityu.edu.hk/event/125 |
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