Magnetic resonance and internal photoemission study of trap centers in high-k dielectric films on Ge

Research output: Chapters, Conference Papers, Creative and Literary Works (RGC: 12, 32, 41, 45)32_Refereed conference paper (with ISBN/ISSN)peer-review

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Author(s)

  • M. K. Bera
  • C. Mahata
  • C. K. Maiti

Related Research Unit(s)

Detail(s)

Original languageEnglish
Title of host publicationPROCEEDINGS OF THE 2007 INTERNATIONAL WORKSHOP ON THE PHYSICS OF SEMICONDUCTOR DEVICES: IWPSD-2007
EditorsKL Narasimhan, DK Sharma
PublisherIEEE
Pages107-110
ISBN (Print)978-1-4244-1727-8
Publication statusPublished - 2007

Conference

Title14th International Workshop on the Physics of Semiconductor Devices
PlaceIndia
CityMumbai
Period17 - 20 December 2007

Abstract

Internal photoemission and magnetic resonance studies have been performed to investigate the charge trapping kinetics and chemical nature of defects present in ultrathin high-k dielectric films deposited on p-Ge (100) substrate. Both the band and defect-related electron states were characterized through EPR, IPE, C-V and IN measurements under UV-illumination. The interface trap spectrum in Ge/high-k oxide systems appears to be dominated by slow acceptor states with a broad energy distribution as major contribution comes from the imperfections located in the insulating layer. However, the oxynitride samples demonstrate lower defect or trapping behavior over non-nitrided samples.

Research Area(s)

  • high-k dielectric, Ge, charge trapping, magnetic resonance, internal photoemission, GERMANIUM MOS DIELECTRICS

Citation Format(s)

Magnetic resonance and internal photoemission study of trap centers in high-k dielectric films on Ge. / Bera, M. K.; Mahata, C.; Maiti, C. K.

PROCEEDINGS OF THE 2007 INTERNATIONAL WORKSHOP ON THE PHYSICS OF SEMICONDUCTOR DEVICES: IWPSD-2007. ed. / KL Narasimhan; DK Sharma. IEEE, 2007. p. 107-110.

Research output: Chapters, Conference Papers, Creative and Literary Works (RGC: 12, 32, 41, 45)32_Refereed conference paper (with ISBN/ISSN)peer-review