Low-Temperature Plasma Constructed Ni-Doped W18O49 Nanorod Arrays to Boosted Electrocatalytic Oxygen Evolution and Urea Oxidation: A. Advanced thin films for energy and sustainable applications

Low-temperature plasma doping controls electrocatalytic active sites of the electrocatalyst are receiving widespread attention. In this study, Ni-doped W₁₈O₄₉ nanorod arrays were prepared using a hydrothermal method followed by low-temperature plasma treatment. The results indicate that Ni doping induces the generation of defects and amorphous structures in W₁₈O₄₉, leading to an increase in oxygen defects. Furthermore, accoupling with high valence W result in Ni active site transfer to more NiOOH at low overpotential during OER, enables CC/WO-Ni-4 exhibit excellent OER performance and its UOR performance was further explored. Specifically, to deliver 10 mAcm^-2 current density, it only requires low overpotential of 265 mV for OER in 1.0M KOH, and it merely needs ultra-low potential in 1.0 M KOH + 500 mM urea, which is 172 mV lower than the required potential in 1.0M KOH. Low-temperature plasma treatment technology provides new ideas for the preparation of highly efficient OER and UOR electrocatalysts.