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Low temperature Cu-Cu direct bonding by (111) oriented nano-twin Cu

  • Jing-Ye Juang*
  • , Yi-Cheng Chu
  • , Chia-Ling Lu
  • , Chih Chen
  • , King-Ning Tu
  • *Corresponding author for this work

Research output: Chapters, Conference Papers, Creative and Literary WorksRGC 32 - Refereed conference paper (with host publication)peer-review

Abstract

In this study, a low temperature solid state diffusion bonding process with (111) highly oriented nano-twined Cu (nt-Cu) was proposed. A less void bonding interface was observed reveals a good bonding quality for the bonded samples. In addition, a large quasi-single grain was identified in the bondedfilm. Based on these results, it is believed that high strength and durable bonding structure can be accomplished by bonding two highly (111)-oriented nt-Cu films.
Original languageEnglish
Title of host publicationProceedings of 2017 5th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D)
PublisherIEEE
Pages32
Number of pages1
ISBN (Electronic)9784904743034, 978-4-904743-05-8
ISBN (Print)978-1-5386-1598-0
DOIs
Publication statusPublished - 2017
Externally publishedYes
Event5th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D 2017) - University of Tokyo, Tokyo, Japan
Duration: 16 May 201718 May 2017

Publication series

NameProceedings of International Workshop on Low Temperature Bonding for 3D Integration, LTB-3D

Conference

Conference5th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D 2017)
PlaceJapan
CityTokyo
Period16/05/1718/05/17

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