Low Cost Universal High-k Dielectric for Solution Processing and Thermal Evaporation Organic Transistors

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

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Author(s)

  • Zongrong Wang
  • Xiaochen Ren
  • Congcheng Fan
  • Ya-Huei Chang
  • Hanying Li
  • Hongzheng Chen
  • Sanqiang Shi
  • Paddy K. L. Chan

Detail(s)

Original languageEnglish
Article number1300119
Journal / PublicationAdvanced Materials Interfaces
Volume1
Issue number3
Publication statusPublished - 1 Jun 2014
Externally publishedYes

Abstract

The surface energy of UV-ozone treated BST dielectric is modulated by the storage duration and environment. By carefully controlling the surface energy, this low temperature, solution processed thin film is employed as the insulator for both thermal evaporated and solution processed OFETs. Both OFETs and saturated load inverters show high mobility and gain with an operating voltage less than 3 V.

Research Area(s)

  • high-k dielectric, organic transistors, surface energy, X-ray diffraction

Bibliographic Note

Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to lbscholars@cityu.edu.hk.

Citation Format(s)

Low Cost Universal High-k Dielectric for Solution Processing and Thermal Evaporation Organic Transistors. / Wang, Zongrong; Ren, Xiaochen; Fan, Congcheng et al.
In: Advanced Materials Interfaces, Vol. 1, No. 3, 1300119, 01.06.2014.

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review