Abstract
Long period waveguide gratings (LPWG) based on a low-loss negative tone epoxy Novolak resin polymer have been fabricated on SiO2/Si substrate using standard cleanroom processes: UV photolithography and reactive ion etching. A maximum attenuation of -18dB and a minimum 3 dB bandwidth of 6nm were measured, and the grating length is as short as 1 cm.
| Original language | English |
|---|---|
| Title of host publication | PROCEEDINGS OF THE SIXTH CHINESE OPTOELECTRONICS SYMPOSIUM |
| Editors | H. S. Kwok, K. T. Chan |
| Publisher | IEEE |
| Pages | 140-143 |
| ISBN (Print) | 0780378873, 9780780378872 |
| DOIs | |
| Publication status | Published - Sept 2003 |
| Event | 6th Chinese Opto-Electronics Symposium (COES'03) - Hong Kong University of Science and Technology, Hong Kong, China Duration: 12 Sept 2003 → 14 Sept 2003 |
Conference
| Conference | 6th Chinese Opto-Electronics Symposium (COES'03) |
|---|---|
| Place | Hong Kong, China |
| Period | 12/09/03 → 14/09/03 |
Research Keywords
- Erbium-doped fiber amplifier
- Etching
- Gratings
- Lithography
- Optical fiber filters
- Optical polymers
- Optical refraction
- Optical surface waves
- Optical variables control
- Optical waveguides
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