Laser removal of micron contaminant colloidal refractory and poor laser absorption particles from super-smooth optical substrate
Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
Author(s)
Detail(s)
| Original language | English |
|---|---|
| Pages (from-to) | 1074-1080 |
| Journal / Publication | Journal of Materials Processing Technology |
| Volume | 153-154 |
| Issue number | 1-3 |
| Publication status | Published - 10 Nov 2004 |
Link(s)
Abstract
Micron and submicron SiO2 polishing particle and remaining polishing powder contaminations on super-smooth glass surface adversely influences: (i) the performance and quality of glass and (ii) the productivity of optical product. To remove these particles, multimode Nd:YAG pulse laser was used to vaporize an applied thin film of black paint on the substrate surface. Experiments to examine the removal efficiency of polishing particles from poor laser absorptive super-smooth K8 optical glass (K8 OG) substrate were performed, and they showed good workability of the cleaning method. Based on the experimental and theoretical results, some mechanisms related to the laser removal of the contaminating colloidal particles from the surface were described. © 2004 Elsevier B. V. All rights reserved.
Research Area(s)
- K8 optical glass, Laser cleaning, Micron contaminants, Super-smooth surface
Citation Format(s)
Laser removal of micron contaminant colloidal refractory and poor laser absorption particles from super-smooth optical substrate. / Hua, Meng; Shi, Xingkuan; Cheung, Edmund et al.
In: Journal of Materials Processing Technology, Vol. 153-154, No. 1-3, 10.11.2004, p. 1074-1080.Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
