Ion-cutting of Si onto glass by pulsed and direct-current plasma immersion ion implantation

F. Lu; D. Qiao; M. Cai; P. K L Yu; S. S. Lau; R. K Y Fu; L. S. Hung; C. P. Li; P. K. Chu; H. C. Chien; Y. Liou

doi:10.1116/1.1609477

Author(s)

F. Lu
D. Qiao
M. Cai
P. K L Yu
S. S. Lau
R. K Y Fu
L. S. Hung
C. P. Li
H. C. Chien
Y. Liou

Detail(s)

Original language	English
Pages (from-to)	2109-2113
Journal / Publication	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	21
Issue number	5
Publication status	Published - Sept 2003

Link(s)

DOI	DOI https://doi.org/10.1116/1.1609477 Final Published version
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Link to Scopus	https://www.scopus.com/record/display.uri?eid=2-s2.0-0242677564&origin=recordpage
Permanent Link	https://scholars.cityu.edu.hk/en/publications/publication(1a6034e3-2c0d-4e00-8b86-6167b9edcede).html

Abstract

Plasma immersion ion implantation was studied for ion-cutting of Si layers onto glass substrate. While a highly defective region was observed near the top of the Si layer transferred onto glass, the crystalline quality was generally quite defect-free in the deeper region of the layer. Experimental results show that the dc PIII mode is more suitable for the ion-cutting process.

Citation Format(s)

[ RIS ] [ BibTeX ]

Ion-cutting of Si onto glass by pulsed and direct-current plasma immersion ion implantation. / Lu, F.; Qiao, D.; Cai, M. et al.
In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 21, No. 5, 09.2003, p. 2109-2113.

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

Lu, F, Qiao, D, Cai, M, Yu, PKL, Lau, SS, Fu, RKY, Hung, LS, Li, CP, Chu, PK, Chien, HC & Liou, Y 2003, 'Ion-cutting of Si onto glass by pulsed and direct-current plasma immersion ion implantation', Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 21, no. 5, pp. 2109-2113. https://doi.org/10.1116/1.1609477

Lu, F., Qiao, D., Cai, M., Yu, P. K. L., Lau, S. S., Fu, R. K. Y., Hung, L. S., Li, C. P., Chu, P. K., Chien, H. C., & Liou, Y. (2003). Ion-cutting of Si onto glass by pulsed and direct-current plasma immersion ion implantation. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 21(5), 2109-2113. https://doi.org/10.1116/1.1609477

Lu F, Qiao D, Cai M, Yu PKL, Lau SS, Fu RKY et al. Ion-cutting of Si onto glass by pulsed and direct-current plasma immersion ion implantation. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 2003 Sept;21(5):2109-2113. doi: 10.1116/1.1609477

Lu, F. ; Qiao, D. ; Cai, M. et al. / Ion-cutting of Si onto glass by pulsed and direct-current plasma immersion ion implantation. In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 2003 ; Vol. 21, No. 5. pp. 2109-2113.