Ion trajectories and shadow effects in mesh-assisted plasma immersion ion implantation of insulator

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal

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Author(s)

  • Yongxian Huang
  • Xiubo Tian
  • Shixiong Lv
  • Shiqin Yang
  • R. K Y Fu
  • Jinsong Leng
  • Yao Li

Detail(s)

Original languageEnglish
Pages (from-to)2910-2913
Journal / PublicationApplied Surface Science
Volume258
Issue number7
Publication statusPublished - 15 Jan 2012

Abstract

A two-dimensional particle-in-cell (PIC) model considering secondary electron emission (SEE) as a function of ion instantaneous incident energy is developed for describing ion trajectories and shadow effects in mesh-assisted plasma immersion ion implantation (PIII) of insulator. The simulation results indicate that mesh-assisted PIII can improve the equivalent surface potential, suppress the emission of secondary electrons and provide better implantation dynamics for ions implantation on insulator. On 5 mm thick polymer substrate, an aluminum plasma implanted coating is achieved with excellent adhesion strength by mesh-assisted PIII with 10 mm mesh height. Consistent results are obtained from experiments and numerical simulation disclosing that shallow effects can be eliminated, and ions incident energy is enhanced. © 2011 Elsevier B.V. All rights reserved.

Research Area(s)

  • Insulator, Ion trajectory, Mesh-assisted plasma immersion ion implantation, Particle-in-cell, Shadow effect

Citation Format(s)

Ion trajectories and shadow effects in mesh-assisted plasma immersion ion implantation of insulator. / Huang, Yongxian; Tian, Xiubo; Lv, Shixiong; Yang, Shiqin; Fu, R. K Y; Chu, Paul K.; Leng, Jinsong; Li, Yao.

In: Applied Surface Science, Vol. 258, No. 7, 15.01.2012, p. 2910-2913.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal