Investigation of plasma potential and pulsed discharge characteristics in enhanced glow discharge plasma immersion ion implantation and deposition

Liuhe Li; Qiuyuan Lu; Ricky K.Y. Fu; Paul K. Chu

doi:10.1016/j.nimb.2009.01.109

Author(s)

Liuhe Li
Qiuyuan Lu
Ricky K.Y. Fu
Paul K. Chu

Detail(s)

Original language	English
Pages (from-to)	1696-1700
Journal / Publication	Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume	267
Issue number	8-9
Publication status	Published - 1 May 2009

Link(s)

DOI	DOI https://doi.org/10.1016/j.nimb.2009.01.109 Final Published version
	Check@CityULib
Link to Scopus	https://www.scopus.com/record/display.uri?eid=2-s2.0-65249150835&origin=recordpage
Permanent Link	https://scholars.cityu.edu.hk/en/publications/publication(a5eaab15-a9dd-41b5-b47a-6e85e7331bf9).html

Abstract

Enhanced glow discharge plasma immersion ion implantation and deposition (EGD-PII&D) does not require external plasma sources. In this technique, the plasma is produced by self-glow discharge when a high negative voltage is applied to the sample. The small-area, pointed-shape hollow anode and large area tabular cathode form an electron-focused electric field. Using a special electric field design, the electrons from either the plasma or target (secondary electrons) are focused to a special hollow anode. As a result of the special electron-focusing field, the self-glow discharge process can be enhanced to achieve effective ion implantation into the substrate. In this work, the plasma potential distribution is investigated in details and the possible pulse discharge mechanism is discussed. The unique characteristics of the pulsed plasma and plasma extinction are studied. © 2009 Elsevier B.V. All rights reserved.

Research Area(s)

Glow discharge, Plasma immersion ion implantation

Citation Format(s)

[ RIS ] [ BibTeX ]

Investigation of plasma potential and pulsed discharge characteristics in enhanced glow discharge plasma immersion ion implantation and deposition. / Li, Liuhe; Lu, Qiuyuan; Fu, Ricky K.Y. et al.
In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Vol. 267, No. 8-9, 01.05.2009, p. 1696-1700.

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

Li, L, Lu, Q, Fu, RKY & Chu, PK 2009, 'Investigation of plasma potential and pulsed discharge characteristics in enhanced glow discharge plasma immersion ion implantation and deposition', Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, vol. 267, no. 8-9, pp. 1696-1700. https://doi.org/10.1016/j.nimb.2009.01.109

Li, L., Lu, Q., Fu, R. K. Y., & Chu, P. K. (2009). Investigation of plasma potential and pulsed discharge characteristics in enhanced glow discharge plasma immersion ion implantation and deposition. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 267(8-9), 1696-1700. https://doi.org/10.1016/j.nimb.2009.01.109

Li L, Lu Q, Fu RKY, Chu PK. Investigation of plasma potential and pulsed discharge characteristics in enhanced glow discharge plasma immersion ion implantation and deposition. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. 2009 May 1;267(8-9):1696-1700. doi: 10.1016/j.nimb.2009.01.109

Li, Liuhe ; Lu, Qiuyuan ; Fu, Ricky K.Y. et al. / Investigation of plasma potential and pulsed discharge characteristics in enhanced glow discharge plasma immersion ion implantation and deposition. In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. 2009 ; Vol. 267, No. 8-9. pp. 1696-1700.