Investigation of plasma potential and pulsed discharge characteristics in enhanced glow discharge plasma immersion ion implantation and deposition

Liuhe Li; Qiuyuan Lu; Ricky K.Y. Fu; Paul K. Chu

doi:10.1016/j.nimb.2009.01.109

Investigation of plasma potential and pulsed discharge characteristics in enhanced glow discharge plasma immersion ion implantation and deposition

Liuhe Li
, Qiuyuan Lu
, Ricky K.Y. Fu
, Paul K. Chu

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

8 Citations (Scopus)

Abstract

Enhanced glow discharge plasma immersion ion implantation and deposition (EGD-PII&D) does not require external plasma sources. In this technique, the plasma is produced by self-glow discharge when a high negative voltage is applied to the sample. The small-area, pointed-shape hollow anode and large area tabular cathode form an electron-focused electric field. Using a special electric field design, the electrons from either the plasma or target (secondary electrons) are focused to a special hollow anode. As a result of the special electron-focusing field, the self-glow discharge process can be enhanced to achieve effective ion implantation into the substrate. In this work, the plasma potential distribution is investigated in details and the possible pulse discharge mechanism is discussed. The unique characteristics of the pulsed plasma and plasma extinction are studied. © 2009 Elsevier B.V. All rights reserved.

Original language	English
Pages (from-to)	1696-1700
Journal	Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume	267
Issue number	8-9
DOIs	https://doi.org/10.1016/j.nimb.2009.01.109
Publication status	Published - 1 May 2009

Research Keywords

Glow discharge
Plasma immersion ion implantation

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10.1016/j.nimb.2009.01.109

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Li, L., Lu, Q., Fu, R. K. Y., & Chu, P. K. (2009). Investigation of plasma potential and pulsed discharge characteristics in enhanced glow discharge plasma immersion ion implantation and deposition. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 267(8-9), 1696-1700. https://doi.org/10.1016/j.nimb.2009.01.109

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title = "Investigation of plasma potential and pulsed discharge characteristics in enhanced glow discharge plasma immersion ion implantation and deposition",

abstract = "Enhanced glow discharge plasma immersion ion implantation and deposition (EGD-PII\&D) does not require external plasma sources. In this technique, the plasma is produced by self-glow discharge when a high negative voltage is applied to the sample. The small-area, pointed-shape hollow anode and large area tabular cathode form an electron-focused electric field. Using a special electric field design, the electrons from either the plasma or target (secondary electrons) are focused to a special hollow anode. As a result of the special electron-focusing field, the self-glow discharge process can be enhanced to achieve effective ion implantation into the substrate. In this work, the plasma potential distribution is investigated in details and the possible pulse discharge mechanism is discussed. The unique characteristics of the pulsed plasma and plasma extinction are studied. {\textcopyright} 2009 Elsevier B.V. All rights reserved.",

keywords = "Glow discharge, Plasma immersion ion implantation",

author = "Liuhe Li and Qiuyuan Lu and Fu, \{Ricky K.Y.\} and Chu, \{Paul K.\}",

year = "2009",

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doi = "10.1016/j.nimb.2009.01.109",

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Li, L, Lu, Q, Fu, RKY & Chu, PK 2009, 'Investigation of plasma potential and pulsed discharge characteristics in enhanced glow discharge plasma immersion ion implantation and deposition', Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, vol. 267, no. 8-9, pp. 1696-1700. https://doi.org/10.1016/j.nimb.2009.01.109

Investigation of plasma potential and pulsed discharge characteristics in enhanced glow discharge plasma immersion ion implantation and deposition. / Li, Liuhe; Lu, Qiuyuan; Fu, Ricky K.Y. et al.
In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Vol. 267, No. 8-9, 01.05.2009, p. 1696-1700.

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

TY - JOUR

T1 - Investigation of plasma potential and pulsed discharge characteristics in enhanced glow discharge plasma immersion ion implantation and deposition

AU - Li, Liuhe

AU - Lu, Qiuyuan

AU - Fu, Ricky K.Y.

AU - Chu, Paul K.

PY - 2009/5/1

Y1 - 2009/5/1

N2 - Enhanced glow discharge plasma immersion ion implantation and deposition (EGD-PII&D) does not require external plasma sources. In this technique, the plasma is produced by self-glow discharge when a high negative voltage is applied to the sample. The small-area, pointed-shape hollow anode and large area tabular cathode form an electron-focused electric field. Using a special electric field design, the electrons from either the plasma or target (secondary electrons) are focused to a special hollow anode. As a result of the special electron-focusing field, the self-glow discharge process can be enhanced to achieve effective ion implantation into the substrate. In this work, the plasma potential distribution is investigated in details and the possible pulse discharge mechanism is discussed. The unique characteristics of the pulsed plasma and plasma extinction are studied. © 2009 Elsevier B.V. All rights reserved.

AB - Enhanced glow discharge plasma immersion ion implantation and deposition (EGD-PII&D) does not require external plasma sources. In this technique, the plasma is produced by self-glow discharge when a high negative voltage is applied to the sample. The small-area, pointed-shape hollow anode and large area tabular cathode form an electron-focused electric field. Using a special electric field design, the electrons from either the plasma or target (secondary electrons) are focused to a special hollow anode. As a result of the special electron-focusing field, the self-glow discharge process can be enhanced to achieve effective ion implantation into the substrate. In this work, the plasma potential distribution is investigated in details and the possible pulse discharge mechanism is discussed. The unique characteristics of the pulsed plasma and plasma extinction are studied. © 2009 Elsevier B.V. All rights reserved.

KW - Glow discharge

KW - Plasma immersion ion implantation

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DO - 10.1016/j.nimb.2009.01.109

M3 - RGC 21 - Publication in refereed journal

SN - 0168-583X

VL - 267

SP - 1696

EP - 1700

JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

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IS - 8-9

ER -

Investigation of plasma potential and pulsed discharge characteristics in enhanced glow discharge plasma immersion ion implantation and deposition

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