Investigation of molecular rearrangement by AFM analysis of SAMs annealing process

Chun-Lung Wu; Hsin-Yi Hsieh; Fan-Gang Tseng; Ching-Chang Chieng

Investigation of molecular rearrangement by AFM analysis of SAMs annealing process

Chun-Lung Wu, Hsin-Yi Hsieh, Fan-Gang Tseng, Ching-Chang Chieng

Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 32 - Refereed conference paper (with host publication) › peer-review

Abstract

Self assembly monolayers (SAMs) are easily prepared nano-film, and have been widely applied to improve device surface properties and biomaterial conjugation on substrates. Among various steps, annealing is one of the general processes for the improvement of SAMs formation quality. However, there have been not many methods developed to investigate the effects of this parameter quantitatively. This paper proposes to quantitatively investigate the effects of annealing on SAMs by both contact angle and interaction force measurement by AFM. Results demonstrate the quality of nano-film would been greatly improved by annealing process, and the film properties are also functions of temperature. The results demonstrated molecular rearrangement under thermal factor.

Original language	English
Title of host publication	2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings
Pages	804-807
Publication status	Published - 2005
Externally published	Yes
Event	2005 NSTI Nanotechnology Conference and Trade Show, NSTI Nanotech 2005 - Anaheim, United States Duration: 8 May 2005 → 12 May 2005 https://briefs.techconnect.org/books/technical-proceedings-of-the-2005-nsti-nanotechnology-conference-and-trade-show-volume-3/

Conference

Conference	2005 NSTI Nanotechnology Conference and Trade Show, NSTI Nanotech 2005
Place	United States
City	Anaheim
Period	8/05/05 → 12/05/05
Internet address	https://briefs.techconnect.org/books/technical-proceedings-of-the-2005-nsti-nanotechnology-conference-and-trade-show-volume-3/

Research Keywords

Adhesion
AFM
Annealing
Self-assembly monolayer

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title = "Investigation of molecular rearrangement by AFM analysis of SAMs annealing process",

abstract = "Self assembly monolayers (SAMs) are easily prepared nano-film, and have been widely applied to improve device surface properties and biomaterial conjugation on substrates. Among various steps, annealing is one of the general processes for the improvement of SAMs formation quality. However, there have been not many methods developed to investigate the effects of this parameter quantitatively. This paper proposes to quantitatively investigate the effects of annealing on SAMs by both contact angle and interaction force measurement by AFM. Results demonstrate the quality of nano-film would been greatly improved by annealing process, and the film properties are also functions of temperature. The results demonstrated molecular rearrangement under thermal factor.",

keywords = "Adhesion, AFM, Annealing, Self-assembly monolayer",

author = "Chun-Lung Wu and Hsin-Yi Hsieh and Fan-Gang Tseng and Ching-Chang Chieng",

year = "2005",

language = "English",

isbn = "0976798506",

pages = "804--807",

booktitle = "2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings",

note = "2005 NSTI Nanotechnology Conference and Trade Show, NSTI Nanotech 2005 ; Conference date: 08-05-2005 Through 12-05-2005",

url = "https://briefs.techconnect.org/books/technical-proceedings-of-the-2005-nsti-nanotechnology-conference-and-trade-show-volume-3/",

}

Investigation of molecular rearrangement by AFM analysis of SAMs annealing process. / Wu, Chun-Lung; Hsieh, Hsin-Yi; Tseng, Fan-Gang et al.
2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings. 2005. p. 804-807.

Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 32 - Refereed conference paper (with host publication) › peer-review

TY - GEN

T1 - Investigation of molecular rearrangement by AFM analysis of SAMs annealing process

AU - Wu, Chun-Lung

AU - Hsieh, Hsin-Yi

AU - Tseng, Fan-Gang

AU - Chieng, Ching-Chang

PY - 2005

Y1 - 2005

N2 - Self assembly monolayers (SAMs) are easily prepared nano-film, and have been widely applied to improve device surface properties and biomaterial conjugation on substrates. Among various steps, annealing is one of the general processes for the improvement of SAMs formation quality. However, there have been not many methods developed to investigate the effects of this parameter quantitatively. This paper proposes to quantitatively investigate the effects of annealing on SAMs by both contact angle and interaction force measurement by AFM. Results demonstrate the quality of nano-film would been greatly improved by annealing process, and the film properties are also functions of temperature. The results demonstrated molecular rearrangement under thermal factor.

AB - Self assembly monolayers (SAMs) are easily prepared nano-film, and have been widely applied to improve device surface properties and biomaterial conjugation on substrates. Among various steps, annealing is one of the general processes for the improvement of SAMs formation quality. However, there have been not many methods developed to investigate the effects of this parameter quantitatively. This paper proposes to quantitatively investigate the effects of annealing on SAMs by both contact angle and interaction force measurement by AFM. Results demonstrate the quality of nano-film would been greatly improved by annealing process, and the film properties are also functions of temperature. The results demonstrated molecular rearrangement under thermal factor.

KW - Adhesion

KW - AFM

KW - Annealing

KW - Self-assembly monolayer

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UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-32044467395&origin=recordpage

M3 - RGC 32 - Refereed conference paper (with host publication)

SN - 0976798506

SN - 9780976798507

SP - 804

EP - 807

BT - 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings

T2 - 2005 NSTI Nanotechnology Conference and Trade Show, NSTI Nanotech 2005

Y2 - 8 May 2005 through 12 May 2005

ER -

Investigation of molecular rearrangement by AFM analysis of SAMs annealing process

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