Inverse Hall-Petch relationship in the nanostructured TiO2 : Skin-depth energy pinning versus surface preferential melting
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Author(s)
Detail(s)
Original language | English |
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Article number | 73503 |
Journal / Publication | Journal of Applied Physics |
Volume | 108 |
Issue number | 7 |
Publication status | Published - 1 Oct 2010 |
Link(s)
Abstract
The functional dependence of stress, elastic modulus, melting point, and their interdependence on the identities (bond order, nature, length, and strength) of a representative bond of the specimen has been established for deeper insight into the transition from the conventional Hall-Petch relationship (HPR) to the inverse HPR (IHPR) for nanostructured TiO2. Theoretical reproduction of the observed inverse HPR suggests that the intrinsic competition between the energy-density gain (elastic modulus enhancement) and the cohesive-energy remnant (melting point depression) in the grain boundaries originates and the extrinsic competition between the activation and the inhibition of atomic dislocations activates the IHPR. © 2010 American Institute of Physics.
Citation Format(s)
Inverse Hall-Petch relationship in the nanostructured TiO2: Skin-depth energy pinning versus surface preferential melting. / Liu, X. J.; Yang, L. W.; Zhou, Z. F. et al.
In: Journal of Applied Physics, Vol. 108, No. 7, 73503, 01.10.2010.
In: Journal of Applied Physics, Vol. 108, No. 7, 73503, 01.10.2010.
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review