Interfacial effects on characteristics of a-Si TFT

X. Zou, D. P. Webb, Y. C. Chan, Y. W. Lam, Z. Xu

Research output: Chapters, Conference Papers, Creative and Literary WorksRGC 32 - Refereed conference paper (with host publication)peer-review

Abstract

The concept of effective density of interface states at a-SiNx:H/a-Si:H interface has been used to analyze the performance of a-Si TFT theoretically, such as field effect, flat band voltage, subthreshold characteristics, as well as experimental research on a-Si TFT. The transfer characteristics of various a-Si TFT and the sub-threshold characteristic parameter S, with different fabrication conditions, have verified the conclusions drawn up from the theoretical analysis in this paper.
Original languageEnglish
Title of host publicationProceedings of the Fourth Asian Symposium on Information Display
PublisherIEEE
Pages69-72
ISBN (Print)962-8273-01-9
DOIs
Publication statusPublished - Feb 1997
Event4th Asian Symposium on Information Display - Hong Kong, China
Duration: 13 Feb 199714 Feb 1997

Conference

Conference4th Asian Symposium on Information Display
PlaceChina
CityHong Kong
Period13/02/9714/02/97

Fingerprint

Dive into the research topics of 'Interfacial effects on characteristics of a-Si TFT'. Together they form a unique fingerprint.

Cite this