Abstract
The concept of effective density of interface states at a-SiNx:H/a-Si:H interface has been used to analyze the performance of a-Si TFT theoretically, such as field effect, flat band voltage, subthreshold characteristics, as well as experimental research on a-Si TFT. The transfer characteristics of various a-Si TFT and the sub-threshold characteristic parameter S, with different fabrication conditions, have verified the conclusions drawn up from the theoretical analysis in this paper.
| Original language | English |
|---|---|
| Title of host publication | Proceedings of the Fourth Asian Symposium on Information Display |
| Publisher | IEEE |
| Pages | 69-72 |
| ISBN (Print) | 962-8273-01-9 |
| DOIs | |
| Publication status | Published - Feb 1997 |
| Event | 4th Asian Symposium on Information Display - Hong Kong, China Duration: 13 Feb 1997 → 14 Feb 1997 |
Conference
| Conference | 4th Asian Symposium on Information Display |
|---|---|
| Place | China |
| City | Hong Kong |
| Period | 13/02/97 → 14/02/97 |
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