Interface characterization and internal electric field evaluation of a-Si: H pin solar cell by variable energy positron annihilation spectroscopy

X. Zou, Y. C. Chan, D. P. Webb, Y. W. Lam, F. Y M Chan, S. H. Lin, Y. F. Hu, C. D. Beling, S. Fung

Research output: Chapters, Conference Papers, Creative and Literary WorksRGC 32 - Refereed conference paper (with host publication)peer-review

Abstract

By means of the slow positron beam Doppler-broadening technique, the depth profile of microvoids across a p-i-n double junction solar cell has been resolved. VEPFIT fitting results indicate an approximately uniform density of the defects throughout the solar cell, but with an enhanced concentration at all of the interfaces possibly due to network mismatch. In order to evaluate the internal electric field, Variable Energy Positron Annihilation Spectroscopy (VEPAS) measurements have been performed on a single junction pin solar cell at different biases. The internal electric field effect on positrons has also been examined in terms of the bias dependence of positron drift in a-Si:H single junction pin solar cell.
Original languageEnglish
Title of host publicationMRS Proceedings
Subtitle of host publicationSymposium A – Amorphous & Microcrystalline Silicon Technology 1998
PublisherMaterials Research Society
Pages643-648
Volume507
ISBN (Electronic)1946-4274
DOIs
Publication statusPublished - Apr 1999
Event1998 MRS Spring Meeting - San Francisco, CA, USA
Duration: 14 Apr 199817 Apr 1998

Publication series

NameMaterials Research Society Symposium - Proceedings
PublisherMaterials Research Society
ISSN (Print)0272-9172

Conference

Conference1998 MRS Spring Meeting
CitySan Francisco, CA, USA
Period14/04/9817/04/98

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