Abstract
The electronic and chemical structures of Cs/PFO, K/PFO, Na/PFO, and Li/PFO interfaces were systematically studied by combined UPS and XPS analysis. It was shown that exposure of films to residual gases at a pressure of 2.0 × 10-9 mbar for 3 h, or to a small amount of oxygen or water vapor could eliminate the gap states and restore the valence band structures. However, immediate deposition of Ag onto the alkali metal/PFO interface protected the films against residual gases and hence the bipolaron states were retained.
| Original language | English |
|---|---|
| Pages (from-to) | 911-918 |
| Journal | Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films |
| Volume | 20 |
| Issue number | 3 |
| DOIs | |
| Publication status | Published - May 2002 |
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