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Interface between poly (9,9-dioctylfluorene) and alkali metals: cesium, potassium, sodium, and lithium

  • M. K. Fung
  • , S. L. Lai
  • , S. N. Bao
  • , C. S. Lee
  • , S. T. Lee
  • , W. W. Wu
  • , M. Inbasekaran
  • , J. J. O'Brien

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

Abstract

The electronic and chemical structures of Cs/PFO, K/PFO, Na/PFO, and Li/PFO interfaces were systematically studied by combined UPS and XPS analysis. It was shown that exposure of films to residual gases at a pressure of 2.0 × 10-9 mbar for 3 h, or to a small amount of oxygen or water vapor could eliminate the gap states and restore the valence band structures. However, immediate deposition of Ag onto the alkali metal/PFO interface protected the films against residual gases and hence the bipolaron states were retained.
Original languageEnglish
Pages (from-to)911-918
JournalJournal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
Volume20
Issue number3
DOIs
Publication statusPublished - May 2002

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