In-situ studies of the crystallization of amorphous CoSi2 films
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Author(s)
Detail(s)
Original language | English |
---|---|
Pages (from-to) | 90-96 |
Journal / Publication | Ultramicroscopy |
Volume | 30 |
Issue number | 1-2 |
Publication status | Published - Jun 1989 |
Externally published | Yes |
Link(s)
Abstract
The crystallization of amorphous CoSi2 is an ideal phase transformation for in-situ studies. This system satisfies the assumptions underlying the Johnson-Mehl-Avrami analysis rather well and produces a microstructure which can be modelled realistically. The nucleation rate can be measured independently of the growth rate. The activation energy for growth is found to be 1.1 eV/atom and microstructural observations suggest that the interface between amorphous and crystalline material is likely to advance by a ledge mechanism. © 1989.
Bibliographic Note
Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].
Citation Format(s)
In-situ studies of the crystallization of amorphous CoSi2 films. / Smith, David A.; Tu, K. N.; Weiss, B. Z.
In: Ultramicroscopy, Vol. 30, No. 1-2, 06.1989, p. 90-96.
In: Ultramicroscopy, Vol. 30, No. 1-2, 06.1989, p. 90-96.
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review