Initial growth of chemical-vapor-deposited Ru from bis(hexafluoroacetylacetonate)dicarbonyl ruthenium

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

8 Scopus Citations
View graph of relations

Author(s)

  • Wei-Yuan Cheng
  • Lu-Sheng Hong
  • Jyh-Chiang Jiang
  • Yun Chi
  • Chien-Ching Lin

Detail(s)

Original languageEnglish
Pages (from-to)31-37
Journal / PublicationThin Solid Films
Volume483
Issue number1-2
Online published15 Jan 2005
Publication statusPublished - 1 Jul 2005
Externally publishedYes

Abstract

Deposition of ruthenium (Ru) was done using chemical vapor deposition with bis(hexafluoroacetylacetonate)dicarbonyl ruthenium (Ru(hfac)2(CO) 2) as the precursor, at temperatures, T, ranging from 548≤T≤623 K. The initial growth behavior on Si (100) surfaces was investigated using atomic force microscopy and X-ray photoelectron spectroscopy. Three-dimensional nucleus growth was observed. For T=573 K and a precursor partial pressure of 1.3×10-1 Pa, after 5 min deposition, the nuclei density observed on an H-terminated Si surface of 4.7×109 cm -2 was about three times that observed on an SiO2 surface. Kinetic analysis of nucleation showed a lower activation energy on an H-terminated surface (5 kcal/mole) than that on an oxide surface (11 kcal/mol). As predicted by quantum chemical calculations, the much larger dissociation energy of Ru-hfac (241 kcal/mol) than of Ru-CO (57 kcal/mol) suggests that the deposition is mainly controlled by the hfac dissociation step. Moreover, the existence of adsorbed H was demonstrated to facilitate Ru deposition by removing hfac ligands through the formation of volatile H(hfac).  

Research Area(s)

  • CVD, Initial growth, Ruthenium

Citation Format(s)

Initial growth of chemical-vapor-deposited Ru from bis(hexafluoroacetylacetonate)dicarbonyl ruthenium. / Cheng, Wei-Yuan; Hong, Lu-Sheng; Jiang, Jyh-Chiang; Chi, Yun; Lin, Chien-Ching.

In: Thin Solid Films, Vol. 483, No. 1-2, 01.07.2005, p. 31-37.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review