Influence of three classic chromium-based transitions on the behavior of film/substrate interface in diamond-like carbon films

Xi Yang; Xiang Yu; Yonghui Wang; Wen Shu; Meng Hua

doi:10.1063/1.4840115

Author(s)

Xi Yang
Xiang Yu
Yonghui Wang
Wen Shu
Meng Hua

Detail(s)

Original language	English
Article number	231607
Journal / Publication	Applied Physics Letters
Volume	103
Issue number	23
Publication status	Published - 2 Dec 2013

Link(s)

DOI	DOI https://doi.org/10.1063/1.4840115 Final Published version
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Attachment(s)	Documents 5888039.pdf Final Published version, 1.76 MB, PDF Publisher's Copyright Statement COPYRIGHT TERMS OF DEPOSITED FINAL PUBLISHED VERSION FILE: This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Xi Yang, Xiang Yu, Yonghui Wang, Wen Shu, and Meng Hua , "Influence of three classic chromium-based transitions on the behavior of film/substrate interface in diamond-like carbon films", Appl. Phys. Lett. 103, 231607 (2013) and may be found at https://doi.org/10.1063/1.4840115.
Link to Scopus	https://www.scopus.com/record/display.uri?eid=2-s2.0-84889796225&origin=recordpage
Permanent Link	https://scholars.cityu.edu.hk/en/publications/publication(7a692eb9-454d-48c6-86b4-b6b4151a2a78).html

Abstract

Three diamond-like carbon (DLC) films with classic chromium-based transitions containing a typical step-like gradient, a linear gradient and a modulation period, were deposited using a mid-frequency dual-magnetron sputtering system. Studies were performed on samples with almost the same Cr content to compare the interfacial structures and compositions of the three chromium-based transitions, and to investigate the internal stress, adhesion strength, and fracture toughness of the films. The synergistic effect of the transitions deterministically influenced the interfacial properties. The films with a linear gradient had the optimal interfacial properties when compared with the other two films. © 2013 AIP Publishing LLC.