Influence of the Implantation Voltage on Film Thickness During Plasma Ion Implantation/Deposition (PIID) Process

Xiubo Tian; L. P. Wang; Q. Y. Zhang; Paul K. Chu

Influence of the Implantation Voltage on Film Thickness During Plasma Ion Implantation/Deposition (PIID) Process

Xiubo Tian
, L. P. Wang
, Q. Y. Zhang
, Paul K. Chu^*

^*Corresponding author for this work

Research output: Conference Papers › RGC 32 - Refereed conference paper (without host publication) › peer-review

Original language	English
Publication status	Published - Sept 2000
Event	5^th Asia-Pacific Conference on Plasma Science & Technology and 13^th Symposium on Plasma Science for Materials - Dalian, China Duration: 10 Sept 2000 → 13 Sept 2000

Conference

Conference	5^th Asia-Pacific Conference on Plasma Science & Technology and 13^th Symposium on Plasma Science for Materials
Place	China
City	Dalian
Period	10/09/00 → 13/09/00

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@conference{ba7d9ba1f47841d3a2fdd6e312aa9a9e,

title = "Influence of the Implantation Voltage on Film Thickness During Plasma Ion Implantation/Deposition (PIID) Process",

author = "Xiubo Tian and Wang, \{L. P.\} and Zhang, \{Q. Y.\} and Chu, \{Paul K.\}",

year = "2000",

month = sep,

language = "English",

note = "5th Asia-Pacific Conference on Plasma Science \& Technology and 13th Symposium on Plasma Science for Materials ; Conference date: 10-09-2000 Through 13-09-2000",

}

Influence of the Implantation Voltage on Film Thickness During Plasma Ion Implantation/Deposition (PIID) Process. / Tian, Xiubo; Wang, L. P.; Zhang, Q. Y. et al.
2000. Paper presented at 5^th Asia-Pacific Conference on Plasma Science & Technology and 13^th Symposium on Plasma Science for Materials, Dalian, China.

Research output: Conference Papers › RGC 32 - Refereed conference paper (without host publication) › peer-review

TY - CONF

T1 - Influence of the Implantation Voltage on Film Thickness During Plasma Ion Implantation/Deposition (PIID) Process

AU - Tian, Xiubo

AU - Wang, L. P.

AU - Zhang, Q. Y.

AU - Chu, Paul K.

PY - 2000/9

Y1 - 2000/9

M3 - RGC 32 - Refereed conference paper (without host publication)

T2 - 5th Asia-Pacific Conference on Plasma Science & Technology and 13th Symposium on Plasma Science for Materials

Y2 - 10 September 2000 through 13 September 2000

ER -