INFLUENCE OF TEMPERATURE AND ION KINETIC ENERGY ON SURFACE ROUGHNESS OF THIN FILMS FABRICATED BY DUAL PLASMA DEPOSITION

L.P. Wang; K.Y. Fu; X.B. Tian; B.Y.  Tang; P.K. Chu

INFLUENCE OF TEMPERATURE AND ION KINETIC ENERGY ON SURFACE ROUGHNESS OF THIN FILMS FABRICATED BY DUAL PLASMA DEPOSITION

L.P. Wang
, K.Y. Fu
, X.B. Tian
, B.Y. Tang
, P.K. Chu

Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 32 - Refereed conference paper (with host publication) › peer-review

Abstract

The surface roughness of thin films affects the crystalline properties as well as their applications and is preferably as small as possible. In our experiments on the fabrication of CeO₂ thin films on Si(100) substrate by dual plasma deposition, we investigate the influence of the substrate temperature and ion kinetic energy on the surface roughness. The roughness decrease with increasing substrate temperature, possibly due to enhanced diffusion of adatoms. A higher ion bombardment energy has a similar effect and it is also believed to be related to the surface diffusion of adatoms. We have also found that when a DC voltage is applied to the substrate and the film is thick to withstand electrical breakdown, the surface is rougher. On the other hand, when the film is thin and the applied DC voltage can cause breakdown in the film, the film exhibits smaller results. We will present our experimental results as well as a mechanism to explain the data.

Original language	English
Title of host publication	Proceedings of MRS Meetings
Subtitle of host publication	Symposium O – Mechanisms of Surface and Microstructure Evolution in Deposited Films and Film Structures
Editors	J.G. Amar, G. Gilmer, J. Sanchez, R. Murty
Pages	283
Volume	672
Publication status	Published - Apr 2001
Event	2001 MRS Spring Meeting - Duration: 17 Apr 2001 → 20 Apr 2001

Conference

Conference	2001 MRS Spring Meeting
Period	17/04/01 → 20/04/01

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Research Unit(s) information for this publication is provided by the author(s) concerned.

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Wang, L. P., Fu, K. Y., Tian, X. B., Tang, B. Y., & Chu, P. K. (2001). INFLUENCE OF TEMPERATURE AND ION KINETIC ENERGY ON SURFACE ROUGHNESS OF THIN FILMS FABRICATED BY DUAL PLASMA DEPOSITION. In J. G. Amar, G. Gilmer, J. Sanchez, & R. Murty (Eds.), Proceedings of MRS Meetings: Symposium O – Mechanisms of Surface and Microstructure Evolution in Deposited Films and Film Structures (Vol. 672, pp. 283)

Wang, L.P. ; Fu, K.Y. ; Tian, X.B. et al. / INFLUENCE OF TEMPERATURE AND ION KINETIC ENERGY ON SURFACE ROUGHNESS OF THIN FILMS FABRICATED BY DUAL PLASMA DEPOSITION. Proceedings of MRS Meetings: Symposium O – Mechanisms of Surface and Microstructure Evolution in Deposited Films and Film Structures . editor / J.G. Amar ; G. Gilmer ; J. Sanchez ; R. Murty. Vol. 672 2001. pp. 283

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title = "INFLUENCE OF TEMPERATURE AND ION KINETIC ENERGY ON SURFACE ROUGHNESS OF THIN FILMS FABRICATED BY DUAL PLASMA DEPOSITION",

abstract = "The surface roughness of thin films affects the crystalline properties as well as their applications and is preferably as small as possible. In our experiments on the fabrication of CeO2 thin films on Si(100) substrate by dual plasma deposition, we investigate the influence of the substrate temperature and ion kinetic energy on the surface roughness. The roughness decrease with increasing substrate temperature, possibly due to enhanced diffusion of adatoms. A higher ion bombardment energy has a similar effect and it is also believed to be related to the surface diffusion of adatoms. We have also found that when a DC voltage is applied to the substrate and the film is thick to withstand electrical breakdown, the surface is rougher. On the other hand, when the film is thin and the applied DC voltage can cause breakdown in the film, the film exhibits smaller results. We will present our experimental results as well as a mechanism to explain the data.",

author = "L.P. Wang and K.Y. Fu and X.B. Tian and B.Y. Tang and P.K. Chu",

note = "Research Unit(s) information for this publication is provided by the author(s) concerned.; 2001 MRS Spring Meeting ; Conference date: 17-04-2001 Through 20-04-2001",

year = "2001",

month = apr,

language = "English",

volume = "672",

pages = "283",

editor = "J.G. Amar and G. Gilmer and J. Sanchez and R. Murty",

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Wang, LP, Fu, KY, Tian, XB, Tang, BY & Chu, PK 2001, INFLUENCE OF TEMPERATURE AND ION KINETIC ENERGY ON SURFACE ROUGHNESS OF THIN FILMS FABRICATED BY DUAL PLASMA DEPOSITION. in JG Amar, G Gilmer, J Sanchez & R Murty (eds), Proceedings of MRS Meetings: Symposium O – Mechanisms of Surface and Microstructure Evolution in Deposited Films and Film Structures . vol. 672, pp. 283, 2001 MRS Spring Meeting, 17/04/01.

INFLUENCE OF TEMPERATURE AND ION KINETIC ENERGY ON SURFACE ROUGHNESS OF THIN FILMS FABRICATED BY DUAL PLASMA DEPOSITION. / Wang, L.P.; Fu, K.Y.; Tian, X.B. et al.
Proceedings of MRS Meetings: Symposium O – Mechanisms of Surface and Microstructure Evolution in Deposited Films and Film Structures . ed. / J.G. Amar; G. Gilmer; J. Sanchez; R. Murty. Vol. 672 2001. p. 283.

Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 32 - Refereed conference paper (with host publication) › peer-review

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AU - Wang, L.P.

AU - Fu, K.Y.

AU - Tian, X.B.

AU - Tang, B.Y.

AU - Chu, P.K.

N1 - Research Unit(s) information for this publication is provided by the author(s) concerned.

PY - 2001/4

Y1 - 2001/4

N2 - The surface roughness of thin films affects the crystalline properties as well as their applications and is preferably as small as possible. In our experiments on the fabrication of CeO2 thin films on Si(100) substrate by dual plasma deposition, we investigate the influence of the substrate temperature and ion kinetic energy on the surface roughness. The roughness decrease with increasing substrate temperature, possibly due to enhanced diffusion of adatoms. A higher ion bombardment energy has a similar effect and it is also believed to be related to the surface diffusion of adatoms. We have also found that when a DC voltage is applied to the substrate and the film is thick to withstand electrical breakdown, the surface is rougher. On the other hand, when the film is thin and the applied DC voltage can cause breakdown in the film, the film exhibits smaller results. We will present our experimental results as well as a mechanism to explain the data.

AB - The surface roughness of thin films affects the crystalline properties as well as their applications and is preferably as small as possible. In our experiments on the fabrication of CeO2 thin films on Si(100) substrate by dual plasma deposition, we investigate the influence of the substrate temperature and ion kinetic energy on the surface roughness. The roughness decrease with increasing substrate temperature, possibly due to enhanced diffusion of adatoms. A higher ion bombardment energy has a similar effect and it is also believed to be related to the surface diffusion of adatoms. We have also found that when a DC voltage is applied to the substrate and the film is thick to withstand electrical breakdown, the surface is rougher. On the other hand, when the film is thin and the applied DC voltage can cause breakdown in the film, the film exhibits smaller results. We will present our experimental results as well as a mechanism to explain the data.

M3 - RGC 32 - Refereed conference paper (with host publication)

VL - 672

SP - 283

BT - Proceedings of MRS Meetings

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A2 - Gilmer, G.

A2 - Sanchez, J.

A2 - Murty, R.

T2 - 2001 MRS Spring Meeting

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ER -

Wang LP, Fu KY, Tian XB, Tang BY, Chu PK. INFLUENCE OF TEMPERATURE AND ION KINETIC ENERGY ON SURFACE ROUGHNESS OF THIN FILMS FABRICATED BY DUAL PLASMA DEPOSITION. In Amar JG, Gilmer G, Sanchez J, Murty R, editors, Proceedings of MRS Meetings: Symposium O – Mechanisms of Surface and Microstructure Evolution in Deposited Films and Film Structures . Vol. 672. 2001. p. 283

INFLUENCE OF TEMPERATURE AND ION KINETIC ENERGY ON SURFACE ROUGHNESS OF THIN FILMS FABRICATED BY DUAL PLASMA DEPOSITION

Abstract

Conference

Bibliographical note

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