Influence of pulsed laser deposition rate on the microstructure and thermoelectric properties of Ca3Co4O9 thin films

T. Sun; J. Ma; Q. Y. Yan; Y. Z. Huang; J. L. Wang; H. H. Hng

doi:10.1016/j.jcrysgro.2009.06.044

Influence of pulsed laser deposition rate on the microstructure and thermoelectric properties of Ca₃Co₄O₉ thin films

T. Sun
, J. Ma
, Q. Y. Yan
, Y. Z. Huang
, J. L. Wang
, H. H. Hng

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

37 Citations (Scopus)

Abstract

The effects of deposition rate on the microstructure and thermoelectric (TE) properties of Ca₃Co₄O₉ thin films fabricated by pulsed laser deposition (PLD) technique were investigated. X-ray diffraction (XRD) and high-resolution transmission electron microscopy (HR-TEM) revealed that a fast deposition rate resulted in not only low crystallinity but also the existence of the Ca_xCoO₂ secondary phase. Formation of Ca_xCoO₂ was inevitable during the thin film growth, and this was discussed from both structural and compositional point of view. With longer deposition interval or with sufficient oxygen at a lower deposition rate, the Ca_xCoO₂ phase was able to transit into the desired Ca₃Co₄O₉ phase during the coalescence process. The quality of the thin films was further analyzed by electrical properties measurements. The Ca₃Co₄O₉ thin film fabricated at a slower deposition rate was found to exhibit a low electrical resistivity of 9.4 mΩ cm and high Seebeck coefficient of 240 μV/K at about 700 °C, indicating a good quality film. © 2009 Elsevier B.V. All rights reserved.

Original language	English
Pages (from-to)	4123-4128
Journal	Journal of Crystal Growth
Volume	311
Issue number	16
DOIs	https://doi.org/10.1016/j.jcrysgro.2009.06.044
Publication status	Published - 1 Aug 2009
Externally published	Yes

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Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].

Research Keywords

A1. Atomic force microscopy
A1. Surface structure
A1. X-ray diffraction
A3. Laser epitaxy
B1. Oxides

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title = "Influence of pulsed laser deposition rate on the microstructure and thermoelectric properties of Ca3Co4O9 thin films",

abstract = "The effects of deposition rate on the microstructure and thermoelectric (TE) properties of Ca3Co4O9 thin films fabricated by pulsed laser deposition (PLD) technique were investigated. X-ray diffraction (XRD) and high-resolution transmission electron microscopy (HR-TEM) revealed that a fast deposition rate resulted in not only low crystallinity but also the existence of the CaxCoO2 secondary phase. Formation of CaxCoO2 was inevitable during the thin film growth, and this was discussed from both structural and compositional point of view. With longer deposition interval or with sufficient oxygen at a lower deposition rate, the CaxCoO2 phase was able to transit into the desired Ca3Co4O9 phase during the coalescence process. The quality of the thin films was further analyzed by electrical properties measurements. The Ca3Co4O9 thin film fabricated at a slower deposition rate was found to exhibit a low electrical resistivity of 9.4 mΩ cm and high Seebeck coefficient of 240 μV/K at about 700 °C, indicating a good quality film. {\textcopyright} 2009 Elsevier B.V. All rights reserved.",

keywords = "A1. Atomic force microscopy, A1. Surface structure, A1. X-ray diffraction, A3. Laser epitaxy, B1. Oxides",

author = "T. Sun and J. Ma and Yan, \{Q. Y.\} and Huang, \{Y. Z.\} and Wang, \{J. L.\} and Hng, \{H. H.\}",

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TY - JOUR

T1 - Influence of pulsed laser deposition rate on the microstructure and thermoelectric properties of Ca3Co4O9 thin films

AU - Sun, T.

AU - Ma, J.

AU - Yan, Q. Y.

AU - Huang, Y. Z.

AU - Wang, J. L.

AU - Hng, H. H.

N1 - Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].

PY - 2009/8/1

Y1 - 2009/8/1

N2 - The effects of deposition rate on the microstructure and thermoelectric (TE) properties of Ca3Co4O9 thin films fabricated by pulsed laser deposition (PLD) technique were investigated. X-ray diffraction (XRD) and high-resolution transmission electron microscopy (HR-TEM) revealed that a fast deposition rate resulted in not only low crystallinity but also the existence of the CaxCoO2 secondary phase. Formation of CaxCoO2 was inevitable during the thin film growth, and this was discussed from both structural and compositional point of view. With longer deposition interval or with sufficient oxygen at a lower deposition rate, the CaxCoO2 phase was able to transit into the desired Ca3Co4O9 phase during the coalescence process. The quality of the thin films was further analyzed by electrical properties measurements. The Ca3Co4O9 thin film fabricated at a slower deposition rate was found to exhibit a low electrical resistivity of 9.4 mΩ cm and high Seebeck coefficient of 240 μV/K at about 700 °C, indicating a good quality film. © 2009 Elsevier B.V. All rights reserved.

AB - The effects of deposition rate on the microstructure and thermoelectric (TE) properties of Ca3Co4O9 thin films fabricated by pulsed laser deposition (PLD) technique were investigated. X-ray diffraction (XRD) and high-resolution transmission electron microscopy (HR-TEM) revealed that a fast deposition rate resulted in not only low crystallinity but also the existence of the CaxCoO2 secondary phase. Formation of CaxCoO2 was inevitable during the thin film growth, and this was discussed from both structural and compositional point of view. With longer deposition interval or with sufficient oxygen at a lower deposition rate, the CaxCoO2 phase was able to transit into the desired Ca3Co4O9 phase during the coalescence process. The quality of the thin films was further analyzed by electrical properties measurements. The Ca3Co4O9 thin film fabricated at a slower deposition rate was found to exhibit a low electrical resistivity of 9.4 mΩ cm and high Seebeck coefficient of 240 μV/K at about 700 °C, indicating a good quality film. © 2009 Elsevier B.V. All rights reserved.

KW - A1. Atomic force microscopy

KW - A1. Surface structure

KW - A1. X-ray diffraction

KW - A3. Laser epitaxy

KW - B1. Oxides

UR - https://www.scopus.com/pages/publications/68049148514

UR - https://www.scopus.com/pages/publications/68049148514#tab=impact

U2 - 10.1016/j.jcrysgro.2009.06.044

DO - 10.1016/j.jcrysgro.2009.06.044

M3 - RGC 21 - Publication in refereed journal

SN - 0022-0248

VL - 311

SP - 4123

EP - 4128

JO - Journal of Crystal Growth

JF - Journal of Crystal Growth

IS - 16

ER -