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Influence of clique potential parameters on classification using Bayesian MRF model for remote sensing image in Dali Erhai basin

  • Haijun Duan
  • , Guangmin Wu
  • , Dan Liu
  • , John D. Mai
  • , Jianming Chen

    Research output: Chapters, Conference Papers, Creative and Literary WorksRGC 32 - Refereed conference paper (with host publication)peer-review

    Abstract

    Image classification of remote sensing data is an important topic and long-term tasks in applications [1]. Markov random field (MRF) has more advantages in processing contextual information [2]. Bayesian approach enables the incorporation of prior model and likelihood distribution, this paper has formulated a Bayesian-MRF classification model based on MAP-ICM framework. It uses Potts model in label field and assume Gaussian distribution in observation field. According to maximum a posteriori (MAP) criterion, each new classified label can be obtained by the minimum of energy using Iterated Conditional Modes (ICM) algorithm. Finally, classification tasks are carried out by Bayesian-MRF classification model. Experimental results show that: (1) Clique potential parameters affect classification greatly. When it is 0.5, the classification accuracy reaches maximum with the best classification result for study area of Dali Erhai Lake basin using landsat TM data. (2) Bayesian MRF model have obvious advantages in classification for neighbourhood pixels so that it can separate Shadow class from Water class because the Shadow in mountain areas is very similar to Water in spectrum. In this case study, the best classification accuracy reaches 95.8%. The approaches and results will have important reference value for applications such as land use/cover classification, environment/ecological monitoring etc. © (2013) Trans Tech Publications, Switzerland.
    Original languageEnglish
    Title of host publicationMaterials and Manufacturing Research
    Pages508-512
    Volume658
    DOIs
    Publication statusPublished - 2013
    Event2012 International Conference on Materials and Manufacturing Research, ICMMR 2012 - , Hong Kong, China
    Duration: 19 Dec 201220 Dec 2012

    Publication series

    NameAdvanced Materials Research
    Volume658
    ISSN (Print)1022-6680

    Conference

    Conference2012 International Conference on Materials and Manufacturing Research, ICMMR 2012
    PlaceHong Kong, China
    Period19/12/1220/12/12

    Research Keywords

    • Bayesian-MRF classification model
    • Clique potential parameter
    • Iterated conditional modes (ICM)
    • Landsat TM
    • Markov random field (MRF)
    • Maximum a posterior (MAP)

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