Influence of Bias Voltage on the Tribological Properties of Titanium Nitride Films Fabricated by Dynamic Plasma Immersion Ion Implantation/Deposition

Research output: Chapters, Conference Papers, Creative and Literary WorksRGC 32 - Refereed conference paper (with host publication)peer-review

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Author(s)

Related Research Unit(s)

Detail(s)

Original languageEnglish
Title of host publication2002 INTERNATIONAL CONFERENCE ON METALLURGICAL COATINGS AND THIN FILMS - PROGRAM AND ABSTRACTS
Pages58
Publication statusPublished - Apr 2002

Conference

TitleInternational Conference on Metallurgical Coatings and Thin Films 2002
LocationTown and Country Hotel
PlaceUnited States
CitySan Diego
Period22 - 26 April 2002

Bibliographic Note

Full text of this publication does not contain sufficient affiliation information. With consent from the author(s) concerned, the Research Unit(s) information for this record is based on the existing academic department affiliation of the author(s)

Citation Format(s)

Influence of Bias Voltage on the Tribological Properties of Titanium Nitride Films Fabricated by Dynamic Plasma Immersion Ion Implantation/Deposition. / Tian, X.B.; Zhang, T.; Fu, R.K.Y. et al.
2002 INTERNATIONAL CONFERENCE ON METALLURGICAL COATINGS AND THIN FILMS - PROGRAM AND ABSTRACTS. 2002. p. 58.

Research output: Chapters, Conference Papers, Creative and Literary WorksRGC 32 - Refereed conference paper (with host publication)peer-review