Influence of Bias Voltage on the Tribological Properties of Titanium Nitride Films Fabricated by Dynamic Plasma Immersion Ion Implantation/Deposition
Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 32 - Refereed conference paper (with host publication) › peer-review
Author(s)
Related Research Unit(s)
Detail(s)
Original language | English |
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Title of host publication | 2002 INTERNATIONAL CONFERENCE ON METALLURGICAL COATINGS AND THIN FILMS - PROGRAM AND ABSTRACTS |
Pages | 58 |
Publication status | Published - Apr 2002 |
Conference
Title | International Conference on Metallurgical Coatings and Thin Films 2002 |
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Location | Town and Country Hotel |
Place | United States |
City | San Diego |
Period | 22 - 26 April 2002 |
Link(s)
Permanent Link | https://scholars.cityu.edu.hk/en/publications/publication(cf17fd9e-708b-4451-bedd-4f3362eadf9a).html |
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Bibliographic Note
Full text of this publication does not contain sufficient affiliation information. With consent from the author(s) concerned, the Research Unit(s) information for this record is based on the existing academic department affiliation of the author(s)
Citation Format(s)
Influence of Bias Voltage on the Tribological Properties of Titanium Nitride Films Fabricated by Dynamic Plasma Immersion Ion Implantation/Deposition. / Tian, X.B.; Zhang, T.; Fu, R.K.Y. et al.
2002 INTERNATIONAL CONFERENCE ON METALLURGICAL COATINGS AND THIN FILMS - PROGRAM AND ABSTRACTS. 2002. p. 58.
2002 INTERNATIONAL CONFERENCE ON METALLURGICAL COATINGS AND THIN FILMS - PROGRAM AND ABSTRACTS. 2002. p. 58.
Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 32 - Refereed conference paper (with host publication) › peer-review