Influence of Acetylene on Ti Target Poisoning During Pulse-Enhanced Vacuum Arc Evaporation

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • Yinghe Ma
  • Jianguo Yang
  • Xiubo Tian
  • Chunzhi Gong
  • Wenjian Zheng
  • Yanming He
  • Zengliang Gao
  • Lianfeng Wei
  • Kexin Zhang

Detail(s)

Original languageEnglish
Pages (from-to)2799-2809
Journal / PublicationIEEE Transactions on Plasma Science
Volume48
Issue number8
Online published23 Jul 2020
Publication statusPublished - Aug 2020

Abstract

Vacuum arc evaporation is a prospective technique to fabricate hard and wear material due to its high ion energy and plasma density. Nevertheless, target tends to be poisoned by the compound layer in common reactive gases such as acetylene. Then the coating deposition rate and the properties of the coatings would be strongly influenced. Thus, the formation of the compound layer has to be inhibited. Previous studies pointed out the potential of pulse-enhanced vacuum arc evaporation mode for inhibiting the formation of the compound layer. Within the presented study, motion of group spots (GSs), optical emission spectra, and substrate current based on PEVAE mode were examined entirely. The result shows that the area ratio of the compound layer in the target was decreased from about 75% to 42%. The ionization degree of titanium and mean substrate current could be substantially increased by up to 40% and 100%, respectively, in a mixture gas of nitrogen and acetylene due to larger plasma density indicated by higher spectra intensity of plasmas. All of the above made PEVAE prospective candidate to inhibit the formation of the compound layer. Beyond this PEVAE would lead to higher coating rate and denser coating in nitrogen plus acetylene atmosphere.

Research Area(s)

  • Acetylene-nitrogen, cathode group spots (GSs), plasma characteristics, pulse-enhanced vacuum arc evaporation, substrate current

Citation Format(s)

Influence of Acetylene on Ti Target Poisoning During Pulse-Enhanced Vacuum Arc Evaporation. / Ma, Yinghe; Yang, Jianguo; Tian, Xiubo; Gong, Chunzhi; Zheng, Wenjian; He, Yanming; Gao, Zengliang; Wei, Lianfeng; Chu, Paul K.; Zhang, Kexin.

In: IEEE Transactions on Plasma Science, Vol. 48, No. 8, 08.2020, p. 2799-2809.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review