TY - JOUR
T1 - Improvement of film-to-substrate adhesion for diamond and related films by plasma-based technologies
AU - Ma, Lei
AU - Yu, Xiang
AU - Peng, Zhijian
AU - Fu, Zhiqiang
AU - Yue, Wen
AU - Wang, Chengbiao
AU - Hua, Meng
PY - 2011/11
Y1 - 2011/11
N2 - Diamond films become an ideal candidate for tool-coating materials because of its unique properties: 1) highest hardness and heat conductivity; 2) a low friction coefficient; and 3) good chemical stability. Due to their high hardness and toughness, cemented-carbide tools coated with diamond have profound potential applications in industries and currently drawn intensive attention among the academics worldwide. However, the poor adhesion inhered between a diamond coating and a cemented carbide shortens the working life and jeopardizes the tooling accuracy of the coated tools. This paper attempts to reveal systemically some mechanisms likely causing the poor adhesion, illuminates and compares some approaches by using energetic particles to form a multilayered gradient coating system so as to improve the adhesion, which demonstrates certain superior merits. © 2006 IEEE.
AB - Diamond films become an ideal candidate for tool-coating materials because of its unique properties: 1) highest hardness and heat conductivity; 2) a low friction coefficient; and 3) good chemical stability. Due to their high hardness and toughness, cemented-carbide tools coated with diamond have profound potential applications in industries and currently drawn intensive attention among the academics worldwide. However, the poor adhesion inhered between a diamond coating and a cemented carbide shortens the working life and jeopardizes the tooling accuracy of the coated tools. This paper attempts to reveal systemically some mechanisms likely causing the poor adhesion, illuminates and compares some approaches by using energetic particles to form a multilayered gradient coating system so as to improve the adhesion, which demonstrates certain superior merits. © 2006 IEEE.
KW - Adhesion
KW - cemented carbide
KW - diamond film
KW - plasma-based technology
UR - http://www.scopus.com/inward/record.url?scp=81255136213&partnerID=8YFLogxK
UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-81255136213&origin=recordpage
U2 - 10.1109/TPS.2011.2160461
DO - 10.1109/TPS.2011.2160461
M3 - RGC 21 - Publication in refereed journal
SN - 0093-3813
VL - 39
SP - 3072
EP - 3079
JO - IEEE Transactions on Plasma Science
JF - IEEE Transactions on Plasma Science
IS - 11 PART 2
M1 - 5963728
ER -