Improved planar radio frequency inductively coupled plasma configuration in plasma immersion ion implantation

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Detail(s)

Original languageEnglish
Pages (from-to)2704-2708
Journal / PublicationReview of Scientific Instruments
Volume74
Issue number5
Publication statusPublished - May 2003

Abstract

A study was performed on improved planar radio frequency inductively coupled plasma configuration in plasma immersion ion implantation. The external electromagnetic coils was used to produce an axial magnetic field outside the discharge chamber. The results showed that low-pressure, high-energy and high-uniformity ion implantation could be accomplished using this setup.