Improved planar radio frequency inductively coupled plasma configuration in plasma immersion ion implantation

D. L. Tang; R. K Y Fu; X. B. Tian; P. K. Chu

doi:10.1063/1.1568559

Author(s)

D. L. Tang
R. K Y Fu
X. B. Tian
P. K. Chu

Detail(s)

Original language	English
Pages (from-to)	2704-2708
Journal / Publication	Review of Scientific Instruments
Volume	74
Issue number	5
Publication status	Published - May 2003

Link(s)

DOI	DOI https://doi.org/10.1063/1.1568559 Final Published version
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Link to Scopus	https://www.scopus.com/record/display.uri?eid=2-s2.0-0037851031&origin=recordpage
Permanent Link	https://scholars.cityu.edu.hk/en/publications/publication(b201a374-f6db-4a96-8944-b535944bb448).html

Abstract

A study was performed on improved planar radio frequency inductively coupled plasma configuration in plasma immersion ion implantation. The external electromagnetic coils was used to produce an axial magnetic field outside the discharge chamber. The results showed that low-pressure, high-energy and high-uniformity ion implantation could be accomplished using this setup.

Citation Format(s)

[ RIS ] [ BibTeX ]

Improved planar radio frequency inductively coupled plasma configuration in plasma immersion ion implantation. / Tang, D. L.; Fu, R. K Y; Tian, X. B. et al.

In: Review of Scientific Instruments, Vol. 74, No. 5, 05.2003, p. 2704-2708.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

Tang, DL, Fu, RKY, Tian, XB & Chu, PK 2003, 'Improved planar radio frequency inductively coupled plasma configuration in plasma immersion ion implantation', Review of Scientific Instruments, vol. 74, no. 5, pp. 2704-2708. https://doi.org/10.1063/1.1568559

Tang, D. L., Fu, R. K. Y., Tian, X. B., & Chu, P. K. (2003). Improved planar radio frequency inductively coupled plasma configuration in plasma immersion ion implantation. Review of Scientific Instruments, 74(5), 2704-2708. https://doi.org/10.1063/1.1568559

Tang DL, Fu RKY, Tian XB, Chu PK. Improved planar radio frequency inductively coupled plasma configuration in plasma immersion ion implantation. Review of Scientific Instruments. 2003 May;74(5):2704-2708. doi: 10.1063/1.1568559

Tang, D. L. ; Fu, R. K Y ; Tian, X. B. et al. / Improved planar radio frequency inductively coupled plasma configuration in plasma immersion ion implantation. In: Review of Scientific Instruments. 2003 ; Vol. 74, No. 5. pp. 2704-2708.